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Home › Humidity control in EUV lithography

Humidity control in EUV lithography

US Patent 10274847 · Granted Apr 30, 2019

Estimated economic value: $1,428,000 ⓘ

Assignee

TSMC

Inventors

An-Ren Zi (64 patents)
Chin-Hsiang Lin (351 patents)
Ching-Yu Chang (432 patents)
Joy Cheng (77 patents)

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