Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9323155 | Double patterning strategy for contact hole and trench in photolithography | Chun-Kuang Chen, Chih-An Lin, Chien-Wei Wang, Feng-Cheng Hsu | 2016-04-26 |
| 8741552 | Double patterning strategy for contact hole and trench in photolithography | Chun-Kuang Chen, Chih-An Lin, Chien-Wei Wang, Feng-Cheng Hsu | 2014-06-03 |
| 8460856 | Material and method for photolithography | Jen-Chieh Shih, Jian-Hong Chen | 2013-06-11 |
| 8158335 | High etch resistant material for double patterning | Ching-Yu Chang, Jian-Hong Chen, Chih-An Lin | 2012-04-17 |
| 8039195 | Si device making method by using a novel material for packing and unpacking process | Jen-Chieh Shih | 2011-10-18 |
| 8029969 | Material and method for photolithography | Jen-Chieh Shih, Jian-Hong Chen | 2011-10-04 |
| 7777184 | Method for photoresist characterization and analysis | Jen-Chieh Shih | 2010-08-17 |