Issued Patents All Time
Showing 1–25 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12176211 | Reflection mode photomask | Chun-Lang Chen | 2024-12-24 |
| 12124163 | Mask defect prevention | Chi-Ta Lu, Cheng-Ming Lin, Ching-Yueh Chen, Wei-Chung Hu, Ting-Chang Hsu +1 more | 2024-10-22 |
| 12066757 | Mask and method of forming the same | Chun-Lang Chen, Shih-Hao Yang, Jheng-Yuan Chen | 2024-08-20 |
| 12013632 | Pellicle having vent hole | Chue-San Yoo, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh, Pei-Cheng Hsu +2 more | 2024-06-18 |
| 11860530 | Mask defect prevention | Chi-Ta Lu, Cheng-Ming Lin, Ching-Yueh Chen, Wei-Chung Hu, Ting-Chang Hsu +1 more | 2024-01-02 |
| 11854861 | System and method for performing spin dry etching | Chun-Lang Chen | 2023-12-26 |
| 11735421 | Reflection mode photomask and method of making | Chun-Lang Chen | 2023-08-22 |
| 11662656 | Mask and method of forming the same | Chun-Lang Chen, Shih-Hao Yang, Jheng-Yuan Chen | 2023-05-30 |
| 11531263 | Photomask having a plurality of shielding layers | Chun-Lang Chen | 2022-12-20 |
| 11402743 | Mask defect prevention | Chi-Ta Lu, Cheng-Ming Lin, Ching-Yueh Chen, Wei-Chung Hu, Ting-Chang Hsu +1 more | 2022-08-02 |
| 11270884 | Reflection mode photomask | Chun-Lang Chen | 2022-03-08 |
| 11262658 | Photomask, photolithography system and manufacturing process | Che-Yuan Chang, Ming-Ho Tsai, Ching-Hung Lai | 2022-03-01 |
| 11143952 | Pellicle removal method | Chue-San Yoo, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh, Pei-Cheng Hsu +2 more | 2021-10-12 |
| 11099476 | Photomask having a plurality of shielding layers | Chun-Lang Chen | 2021-08-24 |
| 11086211 | Masks and methods of forming the same | Shih-Hao Yang, Chun-Lang Chen | 2021-08-10 |
| 10859906 | Extreme ultraviolet alignment marks | Yi-Fu Hsieh, Jong-Yuh Chang, Hsin-Chang Lee | 2020-12-08 |
| 10852634 | Phase shifter mask | Chun-Lang Chen, Shih-Hao Yang | 2020-12-01 |
| 10845698 | Mask, method of forming the same and method of manufacturing a semiconductor device using the same | Chun-Lang Chen, Shih-Hao Yang, Jheng-Yuan Chen | 2020-11-24 |
| 10678126 | Semiconductor mask blanks with a compatible stop layer | Chun-Lang Chen, Boming Hsu, Tran-Hui Shen | 2020-06-09 |
| 10670956 | Photomask having a plurality of shielding layers | Chun-Lang Chen | 2020-06-02 |
| 10553428 | Reflection mode photomask and fabrication method therefore | Chun-Lang Chen | 2020-02-04 |
| 10345695 | Extreme ultraviolet alignment marks | Yi-Fu Hsieh, Jong-Yuh Chang, Hsin-Chang Lee | 2019-07-09 |
| 10345692 | Photomask and a fabrication method therefor | Chun-Lang Chen, Shih-Hao Yang | 2019-07-09 |
| 10276426 | System and method for performing spin dry etching | Chun-Lang Chen | 2019-04-30 |
| 10274817 | Mask and photolithography system | Ching-Hung Lai, Chih-Chung Huang, Chung-Hung Lin, Chi-Ming Tsai, Ming-Ho Tsai | 2019-04-30 |