Issued Patents All Time
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8785083 | Systems and methods for lithography masks | Hsin-Chang Lee, Jong-Yuh Chang, Chia-Jen Chen, Chun-Lang Chen | 2014-07-22 |
| 8715890 | Semiconductor mask blanks with a compatible stop layer | Chun-Lang Chen, Boming Hsu, Tran-Hui Shen | 2014-05-06 |
| 8629407 | Contamination inspection | Chien-Hung Lai, Biow Hiem Ong, Chia-Shih Lin, Jong-Yuh Chang | 2014-01-14 |
| 8592102 | Cost-effective method for extreme ultraviolet (EUV) mask production | Chin-Hsiang Lin, Heng-Jen Lee, I-Hsiung Huang, Chun-Jen Chen, Rick Lai | 2013-11-26 |
| 8563351 | Method for manufacturing photovoltaic device | Chun-Lang Chen | 2013-10-22 |
| 8319962 | Mask making decision for manufacturing (DFM) on mask quality control | Chien-Chao Huang | 2012-11-27 |
| 8293645 | Method for forming photovoltaic cell | Chun-Lang Chen | 2012-10-23 |
| 8133661 | Superimpose photomask and method of patterning | Hsiao Chih Chang, Dong-Hsu Cheng | 2012-03-13 |
| 8120767 | Mask making decision for manufacturing (DFM) on mask quality control | Chien-Chao Huang | 2012-02-21 |
| 7571421 | System, method, and computer-readable medium for performing data preparation for a mask design | Peng Chen, Chien-Chao Huang | 2009-08-04 |
| 7444199 | Method for preparing mask and wafer data files | Hsin-Ying Lee, Chien-Chao Huang | 2008-10-28 |
| 6841313 | Photomask with dies relating to different functionalities | Fei-Gwo Tsai, Yeou-Hsin Hsieh, Yu-Chin King | 2005-01-11 |
| 6495297 | Type mask for combining off axis illumination and attenuating phase shifting mask patterns | San-De Tzu | 2002-12-17 |
| 6311319 | Solving line-end shortening and corner rounding problems by using a simple checking rule | Ren-Guey Hsieh | 2001-10-30 |
| 6150058 | Method of making attenuating phase-shifting mask using different exposure doses | San-De Tzu | 2000-11-21 |
| 5981109 | Using (LaNiO.sub.3) .sub.X (TiO.sup.2) .sub.1-X and (LaNiO.sub.3) .sub.X (Ta.sub.2 O.sub.5) .sub.1-X oxide absorption composites for attenuating phase shifting blanks and masks | Jon-Yiew Gan, Tai-Bor Wu, Chao-Chen Cheng | 1999-11-09 |
| 5858591 | Optical proximity correction during wafer processing through subfile bias modification with subsequent subfile merging | Chia-Hui Lin, San-De Tzu | 1999-01-12 |
| 5817439 | Method of blind border pattern layout for attenuated phase shifting masks | San-De Tzu, Yi-Hsu Chen | 1998-10-06 |
| 5808892 | Line edge and size definition in e-beam exposure | — | 1998-09-15 |
| 5792578 | Method of forming multiple layer attenuating phase shifting masks | San-De Tzu, Jia Wang, Wen-Hong Huang | 1998-08-11 |
| 5783337 | Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border | San-De Tzu, Wen-Hong Huang, Chia-Hui Lin | 1998-07-21 |
| 5714285 | Using (LaNiO.sub.3).sub.X (TiO.sub.2).sub.1-x oxide absorption composite for attenuating phase shifting blanks and masks | Jon-Yiew Gan, Tai-Bor Wu, Chao-Chen Cheng | 1998-02-03 |
| 5667919 | Attenuated phase shift mask and method of manufacture thereof | Jon-Yiew Gan, Tai-Bor Wu, Chin-Lung Lin | 1997-09-16 |