ST

San-De Tzu

TSMC: 41 patents #828 of 12,232Top 7%
RE Remarkable: 1 patents #2 of 2Top 100%
Overall (All Time): #74,024 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 1–25 of 42 patents

Patent #TitleCo-InventorsDate
7445159 Dual trench alternating phase shift mask fabrication Ming-Shuo Yen, Chung-Hsing Chana 2008-11-04
7434194 Mask for fabricating semiconductor devices and method for designing the same 2008-10-07
7033947 Dual trench alternating phase shift mask fabrication Ming-Shuo Yen, Chung-Hsing Chang 2006-04-25
6872507 Radiation correction method for electron beam lithography Ching-Shiun Chiu, Wei-Zen Chou, Chia-Fang Wu 2005-03-29
6830853 Chrome mask dry etching process to reduce loading effect and defects Sheng-Chi Chin, Chung-Hsing Chang, Hsin-Chang Li 2004-12-14
6830702 Single trench alternating phase shift mask fabrication Chang-Ming Dai, Chung-Hsing Chang, Chen-Hao Hsieh 2004-12-14
6720116 Process flow and pellicle type for 157 nm mask making Anthony Yen, Chung-Hsing Chang, Chen-Hao Hsieh 2004-04-13
6660653 Dual trench alternating phase shift mask fabrication Chang-Ming Dai, Ching-Hsing Chang 2003-12-09
6632590 Enhance the process window of memory cell line/space dense pattern in sub-wavelength process Tsung-Hou Lee, Chih-Hsiung Lee, Gwo-Yuh Shiau, Ching-Sen Kuo 2003-10-14
6631307 Use of logical operations in place of OPC software Yi-Hsu Chen 2003-10-07
6630408 Self alignment process to fabricate attenuated shifting mask with chrome border Ching-Chia Lin 2003-10-07
6495297 Type mask for combining off axis illumination and attenuating phase shifting mask patterns Chih-Chiang Tu 2002-12-17
6432588 Method of forming an improved attenuated phase-shifting photomask Ching-Shiun Chiu 2002-08-13
6423455 Method for fabricating a multiple masking layer photomask 2002-07-23
6403267 Method for high transmittance attenuated phase-shifting mask fabrication Wei-Zen Chen 2002-06-11
6301698 Method for creating the sub-resolution phase shifting pattern for outrigger type phase shifting masks Chia-Hui Lin 2001-10-09
6294295 Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks Chia-Hui Lin, Wei-Zen Chou 2001-09-25
6277528 Method to change transmittance of attenuated phase-shifting masks Wei-Zen Chou 2001-08-21
6261725 Phase angle modulation of PSM by chemical treatment method Wei-Zen Chou, Ching-Shiun Chiu 2001-07-17
6251547 Simplified process for making an outrigger type phase shift mask Chia-Hui Lin, Wei-Zen Chou 2001-06-26
6194103 E-beam double exposure method for manufacturing ASPM mask with chrome border Chinq-Shiun Chiu 2001-02-27
6190809 Cost-effective method to fabricate a combined attenuated-alternating phase shift mask Ching-Shiun Chiu, Wei-Zen Chou 2001-02-20
6174801 E-beam direct writing to pattern step profiles of dielectric layers applied to fill poly via with poly line, contact with metal line, and metal via with metal line Ching-Shiun Chiu, Chia-Hui Lin 2001-01-16
6171914 Synchronized implant process to simplify NLDD/PLDD stage and N+/P+stage into one implant Ni-Ko Liao 2001-01-09
6150058 Method of making attenuating phase-shifting mask using different exposure doses Chih-Chiang Tu 2000-11-21