Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6134014 | Apparatus and method of inspecting phase shift masks using comparison of a mask die image to the mask image database | Shy-Jay Lin | 2000-10-17 |
| 6093507 | Simplified process for fabricating levinson and chromeless type phase shifting masks | — | 2000-07-25 |
| 6077633 | Mask and method of forming a mask for avoiding side lobe problems in forming contact holes | Chia-Hui Lin | 2000-06-20 |
| 6051347 | Application of e-beam proximity over-correction to compensate optical proximity effect in optical lithography process | Chia-Hui Lin | 2000-04-18 |
| 6022644 | Mask containing subresolution line to minimize proximity effect of contact hole | Chia-Hui Lin | 2000-02-08 |
| 6018392 | Apparatus and method for inspecting phase shifting masks | Shy-Jay Lin | 2000-01-25 |
| 6007324 | Double layer method for fabricating a rim type attenuating phase shifting mask | Shy-Jay Lin, Ching-Chia Lin | 1999-12-28 |
| 6001512 | Method of blind border pattern layout for attenuated phase shifting masks | Yi-Hsu Chen | 1999-12-14 |
| 5994009 | Interlayer method utilizing CAD for process-induced proximity effect correction | Shih-Chiang Tu, Chia-Hui Lin | 1999-11-30 |
| 5935736 | Mask and method to eliminate side-lobe effects in attenuated phase shifting masks | — | 1999-08-10 |
| 5897979 | Method of forming multiple layer attenuating phase shifting masks | Jia Wang, Chin-Chiang Tu, Wen-Hong Huang | 1999-04-27 |
| 5888678 | Mask and simplified method of forming a mask integrating attenuating phase shifting mask patterns and binary mask patterns on the same mask substrate | Chia-Hui Lin, Wen-Hong Huang, Ching-Chia Lin | 1999-03-30 |
| 5858591 | Optical proximity correction during wafer processing through subfile bias modification with subsequent subfile merging | Chia-Hui Lin, Chih-Chiang Tu | 1999-01-12 |
| 5853923 | Double layer method for fabricating a rim type attenuating phase shifting mask | — | 1998-12-29 |
| 5817439 | Method of blind border pattern layout for attenuated phase shifting masks | Yi-Hsu Chen, Chih-Chiang Tu | 1998-10-06 |
| 5792578 | Method of forming multiple layer attenuating phase shifting masks | Jia Wang, Chih-Chiang Tu, Wen-Hong Huang | 1998-08-11 |
| 5783337 | Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border | Chih-Chiang Tu, Wen-Hong Huang, Chia-Hui Lin | 1998-07-21 |