Issued Patents All Time
Showing 1–25 of 151 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin | 2025-09-30 |
| 11921434 | Mask cleaning | Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien +2 more | 2024-03-05 |
| 11740563 | Mask cleaning | Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien +2 more | 2023-08-29 |
| 11378894 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh +3 more | 2022-07-05 |
| 11256179 | Mask cleaning | Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien +2 more | 2022-02-22 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen, Chih-Cheng Lin, Chin-Hsiang Lin | 2021-10-05 |
| 11092555 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2021-08-17 |
| 11086227 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu | 2021-07-27 |
| 10976655 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2021-04-13 |
| 10976672 | System and method for performing lithography process in semiconductor device fabrication | Jui-Ching Wu, Jeng-Horng Chen, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien +1 more | 2021-04-13 |
| 10955746 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin | 2021-03-23 |
| 10831094 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2020-11-10 |
| 10747103 | Pellicle fabrication methods and structures thereof | Yun-Yue Lin, Hsuan-Chen Chen, Chih-Cheng Lin, Hsin-Chang Lee, Yao-Ching Ku +3 more | 2020-08-18 |
| 10747097 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu | 2020-08-18 |
| 10718718 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2020-07-21 |
| 10691014 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2020-06-23 |
| 10684552 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen | 2020-06-16 |
| 10520806 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2019-12-31 |
| 10520823 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Jeng-Horng Chen, Shun-Der Wu | 2019-12-31 |
| 10514597 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen, Chih-Cheng Lin, Chin-Hsiang Lin | 2019-12-24 |
| 10459352 | Mask cleaning | Shu-Hao Chang, Norman Chen, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien +2 more | 2019-10-29 |
| 10459353 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh +3 more | 2019-10-29 |
| 10429314 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2019-10-01 |
| 10353285 | Pellicle structures and methods of fabricating thereof | Hsin-Chang Lee, Pei-Cheng Hsu, Yun-Yue Lin, Hsuan-Chen Chen, Hsuan-I WANG | 2019-07-16 |