Issued Patents All Time
Showing 1–25 of 136 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11921434 | Mask cleaning | Shu-Hao Chang, Norman Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2024-03-05 |
| 11914286 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Hsin-Chang Lee, Chih-Cheng Lin | 2024-02-27 |
| 11740563 | Mask cleaning | Shu-Hao Chang, Norman Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2023-08-29 |
| 11378894 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh, Chi-Lun Lu +3 more | 2022-07-05 |
| 11294274 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Hsin-Chang Lee, Chih-Cheng Lin | 2022-04-05 |
| 11256179 | Mask cleaning | Shu-Hao Chang, Norman Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2022-02-22 |
| 11086227 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Anthony Yen | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2021-07-27 |
| 11003069 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen | 2021-05-11 |
| 10976655 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2021-04-13 |
| 10976672 | System and method for performing lithography process in semiconductor device fabrication | Jui-Ching Wu, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien +1 more | 2021-04-13 |
| 10831094 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2020-11-10 |
| 10825684 | Material composition and methods thereof | Shu-Hao Chang, Chien-Chih Chen, Kuo-Chang Kau, Pi-Yeh Chia, Chi-Ren Chen +1 more | 2020-11-03 |
| 10747097 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2020-08-18 |
| 10691014 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2020-06-23 |
| 10685846 | Semiconductor integrated circuit fabrication with pattern-reversing process | Ming-Chin Chien, Jui-Ching Wu, Shu-Hao Chang, Shang-Chieh Chien, Jen-Yang Chung +1 more | 2020-06-16 |
| 10684552 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Anthony Yen | 2020-06-16 |
| 10642148 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen | 2020-05-05 |
| 10534256 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Hsin-Chang Lee, Chih-Cheng Lin | 2020-01-14 |
| 10520806 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2019-12-31 |
| 10520823 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Shun-Der Wu, Anthony Yen | 2019-12-31 |
| 10514610 | Lithography patterning with a gas phase resist | Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang | 2019-12-24 |
| 10459352 | Mask cleaning | Shu-Hao Chang, Norman Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2019-10-29 |
| 10459353 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh, Chi-Lun Lu +3 more | 2019-10-29 |
| 10276372 | Method for integrated circuit patterning | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2019-04-30 |