Issued Patents All Time
Showing 26–50 of 136 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10274838 | System and method for performing lithography process in semiconductor device fabrication | Jui-Ching Wu, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien +1 more | 2019-04-30 |
| 10274819 | EUV pellicle fabrication methods and structures thereof | Pei-Cheng Hsu, Chih-Tsung Shih, Chih-Cheng Lin, Hsin-Chang Lee, Shinn-Sheng Yu +2 more | 2019-04-30 |
| 10168611 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2019-01-01 |
| 10162257 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2018-12-25 |
| 10156790 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Shun-Der Wu, Anthony Yen | 2018-12-18 |
| 10067418 | Particle removal system and method thereof | Shu-Hao Chang, Chi-Lun Lu, Shang-Chieh Chien, Ming-Chin Chien, Jui-Ching Wu +2 more | 2018-09-04 |
| 10061191 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen | 2018-08-28 |
| 10031411 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2018-07-24 |
| 10018920 | Lithography patterning with a gas phase resist | Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang | 2018-07-10 |
| 10007174 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2018-06-26 |
| 9996013 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2018-06-12 |
| 9964850 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Anthony Yen | 2018-05-08 |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Chia-Chun Chung, Norman Chen, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2018-02-06 |
| 9829785 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-11-28 |
| 9823585 | EUV focus monitoring systems and methods | Chih-Tsung Shih, Chieh-Jen Cheng, Chia-Chen Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-11-21 |
| 9766536 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-09-19 |
| 9759997 | Pellicle assembly and method for advanced lithography | Amo Chen, Yun-Yue Lin, Ta-Cheng Lien, Hsin-Chang Lee, Chih-Cheng Lin | 2017-09-12 |
| 9748133 | Via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-08-29 |
| 9733562 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-08-15 |
| 9726983 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-08-08 |
| 9728408 | Method of semiconductor integrated circuit fabrication | Chung-Ju Lee, Chih-Tsung Shih, Shinn-Sheng Yu, Tsung-Min Huang, Anthony Yen | 2017-08-08 |
| 9709884 | EUV mask and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-07-18 |
| 9690186 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-06-27 |
| 9685367 | Photomask for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-06-20 |
| 9678431 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Shun-Der Wu, Anthony Yen | 2017-06-13 |