Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11921434 | Mask cleaning | Shu-Hao Chang, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2024-03-05 |
| 11740563 | Mask cleaning | Shu-Hao Chang, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2023-08-29 |
| 11256179 | Mask cleaning | Shu-Hao Chang, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2022-02-22 |
| 10459352 | Mask cleaning | Shu-Hao Chang, Jeng-Horng Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2019-10-29 |
| 10401837 | Generating risk inventory and common process window for adjustment of manufacturing tool | Hongxin Zhang, Shaowen Gao | 2019-09-03 |
| 10386715 | Methodology for post-integration awareness in optical proximity correction | Feng Wang, Hongxin Zhang, Shaowen Gao | 2019-08-20 |
| 9886543 | Method providing for asymmetric pupil configuration for an extreme ultraviolet lithography process | Chia-Chun Chung, Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2018-02-06 |
| 9484300 | Device resulting from printing minimum width semiconductor features at non-minimum pitch | Sonia Ghosh, Randy W. Mann, Shaowen Gao | 2016-11-01 |
| 9443055 | Methods for retargeting circuit design layouts and for fabricating semiconductor devices using retargeted layouts | Ayman Hamouda, Chidam Kallingal | 2016-09-13 |
| 9366969 | Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication | Chia-Chu Liu, Kuei-Shun Chen, Vencent Chang, Chin-Hsiang Lin | 2016-06-14 |
| 9263349 | Printing minimum width semiconductor features at non-minimum pitch and resulting device | Sonia Ghosh, Randy W. Mann, Shaowen Gao | 2016-02-16 |
| 9171735 | Method for fabricating a semiconductor integrated circuit with a litho-etch, litho-etch process for etching trenches | Sohan S. Mehta, Yuyang Sun, Matthew T. Herrick, Shyam Sundar Pal, Jeong Soo Kim | 2015-10-27 |
| 9091923 | Contrast enhancing exposure system and method for use in semiconductor fabrication | George Liu, Vencent Chang, Kuei-Shun Chen, Chin-Hsiang Lin | 2015-07-28 |
| 9064086 | Retargeting semiconductor device shapes for multiple patterning processes | Yuyang Sun, Chidam Kallingal | 2015-06-23 |
| 9026977 | Power rail layout for dense standard cell library | Marc Tarabbia, Jian Liu, Nader Magdy Hindawy, Tuhin Guha Neogi, Mahbub Rashed +1 more | 2015-05-05 |
| 8993224 | Multiple patterning process for forming trenches or holes using stitched assist features | Yuyang Sun, Jian Liu | 2015-03-31 |
| 8910094 | Retargeting semiconductor device shapes for multiple patterning processes | Yuyang Sun, Chidam Kallingal | 2014-12-09 |
| 8782571 | Multiple patterning process for forming trenches or holes using stitched assist features | Yuyang Sun, Jian Liu | 2014-07-15 |
| 8612904 | Use of polarization and composite illumination source for advanced optical lithography | Chang An Wang, Chidam Kallingal | 2013-12-17 |
| 8472005 | Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication | George Liu, Kuei-Shun Chen, Vencent Chang, Chin-Hsiang Lin | 2013-06-25 |
| 8010915 | Grid-based fragmentation for optical proximity correction in photolithography mask applications | Scott Goad, Paul Ackmann | 2011-08-30 |
| 7838205 | Utilization of electric field with isotropic development in photolithography | Vincent S. Chang, Kuei-Shun Chen, George Liu | 2010-11-23 |
| 7776494 | Lithographic mask and methods for fabricating a semiconductor device | Chidam Kallingal | 2010-08-17 |
| 7642101 | Semiconductor device having in-chip critical dimension and focus patterns | George Liu, Vencent Chang, Chin-Hsiang Lin, Kuei-Shun Chen | 2010-01-05 |
| 7432042 | Immersion lithography process and mask layer structure applied in the same | Vencent Chang, George Liu | 2008-10-07 |