Issued Patents All Time
Showing 51–75 of 136 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9665007 | Rotary EUV collector | Shang-Chieh Chien, Shu-Hao Chang, Jui-Ching Wu, Tsung-Yu Chen, Tzu-Hsiang Chen +2 more | 2017-05-30 |
| 9664999 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu +1 more | 2017-05-30 |
| 9640397 | Method of fabricating a semiconductor integrated circuit using a directed self-assembly block copolymer | Chieh-Han Wu, Chung-Ju Lee, Tien-I Bao, Tsung-Yu Chen, Shinn-Sheng Yu +1 more | 2017-05-02 |
| 9625824 | Extreme ultraviolet lithography collector contamination reduction | Yen-Cheng Lu, Shun-Der Wu, Tzu-Hsiang Chen | 2017-04-18 |
| 9618837 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-04-11 |
| 9612531 | Method of fabricating an integrated circuit with enhanced defect repairability | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-04-04 |
| 9612523 | Structure and method for reflective-type mask | Chih-Tsung Shih, Chi-Lun Lu, Chia-Chen Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-04-04 |
| 9607833 | System and method for photomask particle detection | Shang-Chieh Chien, Shu-Hao Chang, Hsiang-Yu Chou, Kuo-Chang Kau, Shun-Der Wu +1 more | 2017-03-28 |
| 9588419 | Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-03-07 |
| 9575412 | Method and system for reducing pole imbalance by adjusting exposure intensity | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-02-21 |
| 9570302 | Method of patterning a material layer | Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang | 2017-02-14 |
| 9557649 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Chih-Tsung Shih, Shinn-Sheng Yu +1 more | 2017-01-31 |
| 9535334 | Extreme ultraviolet lithography process to print low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2017-01-03 |
| 9535316 | Photomask with three states for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2017-01-03 |
| 9529272 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-12-27 |
| 9529249 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2016-12-27 |
| 9529250 | EUV mask with ITO absorber to suppress out of band radiation | Yi-Ling Hsieh, Shinn-Sheng Yu, Anthony Yen | 2016-12-27 |
| 9488905 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-11-08 |
| 9448491 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-09-20 |
| 9442384 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-09-13 |
| 9442365 | Mask for extreme ultraviolet lithography and method of fabricating same | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2016-09-13 |
| 9442368 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu +1 more | 2016-09-13 |
| 9429858 | Rotary EUV collector | Shang-Chieh Chien, Shu-Hao Chang, Jui-Ching Wu, Tsung-Yu Chen, Tzu-Hsiang Chen +2 more | 2016-08-30 |
| 9418191 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2016-08-16 |
| 9418862 | Method for integrated circuit patterning | Tsung-Min Huang, Chieh-Han Wu, Chung-Ju Lee, Chih-Tsung Shih, Shinn-Sheng Yu | 2016-08-16 |