Issued Patents All Time
Showing 101–125 of 136 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9081288 | Extreme ultraviolet (EUV) mask, method of fabricating the EUV mask and method of inspecting the EUV mask | Chih-Tsung Shih, Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2015-07-14 |
| 9081312 | Method to define multiple layer patterns with a single exposure by E-beam lithography | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2015-07-14 |
| 9046781 | Structure and method for reflective-type mask | Chih-Tsung Shih, Shinn-Sheng Yu, Wei Liu, Chia-Chen Chen, Chi-Lun Lu +1 more | 2015-06-02 |
| 9034569 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2015-05-19 |
| 8987689 | Efficient scan for E-beam lithography | Cheng-Hung Chen, Shih-Chi Wang, Burn Jeng Lin | 2015-03-24 |
| 8988652 | Method and apparatus for ultraviolet (UV) patterning with reduced outgassing | Shu-Hao Chang, Tsiao-Chen Wu, Chia-Hao Hsu, Chia-Chen Chen, Ying-Yu Chen +3 more | 2015-03-24 |
| 8945803 | Smart subfield method for E-beam lithography | Pei-Shiang Chen, Hung-Chun Wang, Cheng-Hung Chen, Shih-Chi Wang, Nian-Fuh Cheng +1 more | 2015-02-03 |
| 8877410 | Data process for E-beam lithography | Cheng-Hung Chen, Pei-Shiang Chen, Shih-Chi Wang | 2014-11-04 |
| 8841049 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Wen-Chun Huang +1 more | 2014-09-23 |
| 8835082 | Method and system for E-beam lithography with multi-exposure | Pei-Shiang Chen, Hung-Chun Wang | 2014-09-16 |
| 8791024 | Method to define multiple layer patterns using a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2014-07-29 |
| 8677511 | Apparatus for charged particle lithography system | Shih-Chi Wang | 2014-03-18 |
| 8609308 | Smart subfield method for E-beam lithography | Pei-Shiang Chen, Hung-Chun Wang, Cheng-Hung Chen, Shih-Chi Wang, Nian-Fuh Cheng +1 more | 2013-12-17 |
| 8601407 | Geometric pattern data quality verification for maskless lithography | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Cheng-Hung Chen, Shih-Chi Wang +3 more | 2013-12-03 |
| 8563224 | Data process for E-beam lithography | Cheng-Hung Chen, Pei-Shiang Chen, Shih-Chi Wang | 2013-10-22 |
| 8563198 | Device and method for providing wavelength reduction with a photomask | Burn Jeng Lin, Chun-Kuang Chen, Tsai-Sheng Gau, Ru-Gun Liu, Jen-Chieh Shih | 2013-10-22 |
| 8507159 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Wen-Chun Huang +1 more | 2013-08-13 |
| 8473877 | Striping methodology for maskless lithography | Hung-Chun Wang, Tzu-Chin Lin, Nian-Fuh Cheng, Wen-Chun Huang, Ru-Gun Liu | 2013-06-25 |
| 8468473 | Method for high volume e-beam lithography | Hung-Chun Wang, Tzu-Chin Lin, Chia-Chi Lin, Nian-Fuh Cheng, Wen-Chun Huang +1 more | 2013-06-18 |
| 8464186 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai, Wen-Chun Huang +1 more | 2013-06-11 |
| 8378319 | System and method for generating direct-write pattern | Faruk Krecinic, Shy-Jay Lin, Shih-Ming Chang, Tuane Ying Fang, Wei-Long Wang +1 more | 2013-02-19 |
| 8143602 | High-volume manufacturing massive e-beam maskless lithography system | Shy-Jay Lin, Burn Jeng Lin | 2012-03-27 |
| 7851774 | System and method for direct writing to a wafer | Burn Jeng Lin, Shy-Jay Lin, Tsai-Sheng Gau | 2010-12-14 |
| 7659964 | Level adjustment systems and adjustable pin chuck thereof | Burn Jeng Lin, Tsai-Sheng Gau | 2010-02-09 |
| 7078351 | Photoresist intensive patterning and processing | Yuan-Hung Chiu, Ming-Huan Tsai, Hun-Jan Tao | 2006-07-18 |