Issued Patents All Time
Showing 126–136 of 136 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6982135 | Pattern compensation for stitching | Chung-Hsing Chang, Chien-Hung Lin, Burn Jeng Lin, Chia-Hui Lin, Chih-Cheng Chin +3 more | 2006-01-03 |
| 6777340 | Method of etching a silicon containing layer using multilayer masks | Hsien-Kuang Chiu, Fang Chen, Hun-Jan Tao, Yuan-Hung Chiu | 2004-08-17 |
| 6566017 | Semiconductor wafer imaging mask having uniform pattern features and method of making same | Shi-Jay Lin | 2003-05-20 |
| 6444371 | Prevention of die loss to chemical mechanical polishing | Syun-Ming Jang, Jui-Yu Chang, Chen-Hua Yu, Chung-Long Chang, Tsu Shih | 2002-09-03 |
| 6277658 | Method for monitoring alignment mark shielding | Shwangming Jeng, Chen-Hua Yu | 2001-08-21 |
| 6274281 | Using different transmittance with attenuate phase shift mask (APSM) to compensate ADI critical dimension proximity | — | 2001-08-14 |
| 6118185 | Segmented box-in-box for improving back end overlay measurement | Tsu Shih | 2000-09-12 |
| 5972798 | Prevention of die loss to chemical mechanical polishing | Syun-Ming Jang, Jui-Yu Chang, Chen-Hua Yu, Chung-Long Chang, Tsu Shih | 1999-10-26 |
| 5933744 | Alignment method for used in chemical mechanical polishing process | Tsu Shih, Jui-Yu Chang, Chung-Long Chang | 1999-08-03 |
| 5919714 | Segmented box-in-box for improving back end overlay measurement | Tsu Shih | 1999-07-06 |
| 5738961 | Two-step photolithography method for aligning and patterning non-transparent layers | — | 1998-04-14 |