Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9543896 | Multiple-input multiple-output low-noise block downconverter and low-noise module | Hsin-Ta Wu, Jau-Jr Lin | 2017-01-10 |
| 9258072 | Multiple-input multiple-output low-noise block downconverter and low-noise module | Hsin-Ta Wu, Jau-Jr Lin | 2016-02-09 |
| 8289008 | Voltage regulator which provides sequentially and arbitrarrily shaped regulated voltage and related method | Chih-Wei Chen, Jin-Lien Lin | 2012-10-16 |
| 7514985 | Fast turn on and off speed in PLL cascoded charge pump | — | 2009-04-07 |
| 6737310 | Self-aligned process for a stacked gate RF MOSFET device | Chaochieh Tsai, Chung-Long Chang, Shyh-Chyi Wong | 2004-05-18 |
| 6465897 | Method for photo alignment after CMP planarization | Tsu Shih | 2002-10-15 |
| 6444371 | Prevention of die loss to chemical mechanical polishing | Syun-Ming Jang, Chen-Hua Yu, Chung-Long Chang, Tsu Shih, Jeng-Horng Chen | 2002-09-03 |
| 6080635 | Method of photo alignment for shallow trench isolation with chemical mechanical polishing | Syun-Ming Jang | 2000-06-27 |
| 6043133 | Method of photo alignment for shallow trench isolation chemical-mechanical polishing | Syun-Ming Jang, Ying-Ho Chen, Chen-Hua Yu | 2000-03-28 |
| 6020249 | Method for photo alignment after CMP planarization | Tsu Shih, Syun-Ming Jang, Chen-Hua Yu | 2000-02-01 |
| 5972798 | Prevention of die loss to chemical mechanical polishing | Syun-Ming Jang, Chen-Hua Yu, Chung-Long Chang, Tsu Shih, Jeng-Horng Chen | 1999-10-26 |
| 5968687 | Mask for recovering alignment marks after chemical mechanical polishing | Chunshing Chen, Syun-Ming Jang, Ying-Ho Chen | 1999-10-19 |
| 5933744 | Alignment method for used in chemical mechanical polishing process | Jeng-Horng Chen, Tsu Shih, Chung-Long Chang | 1999-08-03 |
| 5923996 | Method to protect alignment mark in CMP process | Tsu Shih, Syun-Ming Jang, Chen-Hua Yu | 1999-07-13 |
| 5902707 | Mask containing alignment mark protection pattern | Tsu-Yu Chu, Kun-Pi Cheng | 1999-05-11 |
| 5858588 | Method for recovering alignment marks after chemical mechanical polishing | Chunshing Chen, Syun-Ming Jang, Ying-Ho Chen | 1999-01-12 |
| 5843600 | Use of sub divided pattern for alignment mark recovery after inter-level dielectric planarization | Tsu-Yu Chu, Kun-Pi Cheng | 1998-12-01 |