Issued Patents All Time
Showing 1–25 of 142 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9218974 | Sidewall free CESL for enlarging ILD gap-fill window | Han-Pin Chung, Bor Chiuan Hsieh, Shiang-Bau Wang | 2015-12-22 |
| 8999834 | Sidewall-free CESL for enlarging ILD gap-fill window | Han-Pin Chung, Bor Chiuan Hsieh, Shiang-Bau Wang | 2015-04-07 |
| 8970015 | Method for protecting a gate structure during contact formation | Hong-Dyi Chang, Pei-Chao Su, Kong-Beng Thei, Harry-Hak-Lay Chuang | 2015-03-03 |
| 8658525 | Methods for a gate replacement process | Matt Yeh, Hui Ouyang, Da-Yuan Lee, Kuang-Yuan Hsu, Xiong-Fei Yu | 2014-02-25 |
| 8648446 | Method for protecting a gate structure during contact formation | Hong-Dyi Chang, Pei-Chao Su, Kong-Beng Thei, Harry-Hak-Lay Chuang | 2014-02-11 |
| 8529783 | Method for backside polymer reduction in dry-etch process | Huang-Ming Chen, Chun-Li Chou, Chao-Cheng Chen | 2013-09-10 |
| 8497169 | Method for protecting a gate structure during contact formation | Hong-Dyi Chang, Pei-Chao Su, Kong-Beng Thei, Harry-Hak-Lay Chuang | 2013-07-30 |
| 8415799 | Dual damascene interconnect in hybrid dielectric | Yi-Nien Su, Jyu-Horng Shieh | 2013-04-09 |
| 8384159 | Semiconductor devices and methods with bilayer dielectrics | Fong-Yu Yen, Cheng-Lung Hung, Peng-Fu Hsu, Vencent Chang, Yong-Tian Hou +1 more | 2013-02-26 |
| 8372755 | Multilayer hard mask | Shiang-Bau Wang | 2013-02-12 |
| 8367563 | Methods for a gate replacement process | Matt Yeh, Hui Ouyang, Da-Yuan Lee, Kuang-Yuan Hsu, Xiong-Fei Yu | 2013-02-05 |
| 8299508 | CMOS structure with multiple spacers | Bor Chiuan Hsieh, Han-Ping Chung, Chih-Hsin Ko, Bor-Wen Chan | 2012-10-30 |
| 8283222 | Method to form a semiconductor device having gate dielectric layers of varying thickness | Kuang-Yuan Hsu, Da-Yuan Lee, Wei-Yang Lee | 2012-10-09 |
| 8202776 | Method for protecting a gate structure during contact formation | Hong-Dyi Chang, Pei-Chao Su, Kong-Beng Thei, Harry-Hak-Lay Chuang | 2012-06-19 |
| 8148270 | Low K dielectric surface damage control | Ryan Chia-Jen Chen, Mong-Song Liang | 2012-04-03 |
| 8110490 | Gate oxide leakage reduction | Matt Yeh, Da-Yuan Lee, Chi-Chun Chen | 2012-02-07 |
| 8008143 | Method to form a semiconductor device having gate dielectric layers of varying thicknesses | Kuang-Yuan Hsu, Da-Yuan Lee, Wei-Yang Lee | 2011-08-30 |
| 7947591 | Semiconductor devices with dual-metal gate structures and fabrication methods thereof | Peng-Fu Hsu, Fong-Yu Yen, Yi-Shien Mor, Huan-Just Lin, Ying Jin | 2011-05-24 |
| 7939396 | Base oxide engineering for high-K gate stacks | Peng-Fu Hsu, Jin Ying | 2011-05-10 |
| 7875547 | Contact hole structures and contact structures and fabrication methods thereof | Ju-Wang Hsu, Jyu-Horng Shieh, Yi-Nien Su, Peng-Fu Hsu | 2011-01-25 |
| 7834389 | Triangular space element for semiconductor device | Yu-Lien Huang, Yi-Chen Huang, Jim Huang, Weng Chang | 2010-11-16 |
| 7824990 | Multi-metal-oxide high-K gate dielectrics | Vincent S. Chang, Fong-Yu Yen, Peng-Soon Lim, Jin Ying | 2010-11-02 |
| 7732878 | MOS devices with continuous contact etch stop layer | Liang-Gi Yao, Shiang-Bau Wang, Huan-Just Lin, Peng-Fu Hsu, Jin Ying | 2010-06-08 |
| 7713380 | Method and apparatus for backside polymer reduction in dry-etch process | Huang-Ming Chen, Chun-Li Chou, Chao-Cheng Chen | 2010-05-11 |
| 7709392 | Low K dielectric surface damage control | Ryan Chia-Jen Chen, Mong-Song Liang | 2010-05-04 |