Issued Patents All Time
Showing 1–25 of 150 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12426229 | Multipatterning gate processing | Y.L. Cheng, Tzu-Wen Pan, Yu-Hsien Lin | 2025-09-23 |
| 12408412 | Air spacers around contact plugs and method forming same | Chen-Huang Huang, Ming-Jhe Sie, Yih-Ann Lin, An Chyi Wei | 2025-09-02 |
| 12363994 | Residue-free metal gate cutting for fin-like field effect transistor | Ya-Yi Tsai, Yi-Hsuan Hsiao, Shu-Yuan Ku, Ming-Ching Chang | 2025-07-15 |
| 12310096 | Method for fabricating semiconductor structure with cutting depth control | Chih-Chang Hung, Shu-Yuan Ku, I-Wei Yang, Yi-Hsuan Hsiao, Ming-Ching Chang | 2025-05-20 |
| 12302596 | Fin field-effect transistor and method of forming the same | Chao-Hsuan Chen, Ming-Chia Tai, Yu-Hsien Lin, Shun-Hui Yang | 2025-05-13 |
| 12294004 | Fin field-effect transistor and method of forming the same | Yi-Chun Chen, Jih-Jse Lin | 2025-05-06 |
| 12272689 | Semiconductor structure with composite oxide layer | Yuan-Sheng Huang | 2025-04-08 |
| 12170332 | Fin field effect transistor devices including NMOS device and PMOS device with varied geometry of work function layers | Yuan-Sheng Huang | 2024-12-17 |
| 12132050 | Semiconductor structure cutting process and structures formed thereby | Cheng-Chung Chang, Shao-Hua Hsu, Yu-Hsien Lin, Ming-Ching Chang, Li-Wei Yin +2 more | 2024-10-29 |
| 12112990 | Semiconductor device with cut metal gate and method of manufacture | Yi-Chun Chen, Ya-Yi Tsai, I-Wei Yang, Shu-Yuan Ku | 2024-10-08 |
| 12087639 | Fin field-effect transistor devices and methods of forming the same | Chih-Chang Hung, Chieh-Ning Feng, Chun-Liang Lai, Yih-Ann Lin | 2024-09-10 |
| 12068199 | Methods for forming fin field-effect transistors | Yih-Ann Lin, Chia Tai Lin, Chao-Cheng Chen | 2024-08-20 |
| 12027608 | Semiconductor structure having dielectric structure extending into second cavity of semiconductor Fin | Li-Wei Yin, Tzu-Wen Pan, Cheng-Chung Chang, Shao-Hua Hsu, Yi-Chun Chen +2 more | 2024-07-02 |
| 12021079 | Fin field-effect transistor and method of forming the same | Yi-Chun Chen, Jih-Jse Lin | 2024-06-25 |
| 12017192 | Carbonation mixing nozzles | Ken-Sheng Lin, Tie He Yang, Jack Richardson | 2024-06-25 |
| 12020986 | Semiconductor structure and method of manufacturing the same | Yuan-Sheng Huang | 2024-06-25 |
| 12015071 | Air spacers around contact plugs and method forming same | Chen-Huang Huang, Ming-Jhe Sie, Yih-Ann Lin, An Chyi Wei | 2024-06-18 |
| 12015030 | Gate stacks for semiconductor devices of different conductivity types | Yih-Ann Lin, Donald Y. Chao, Yi-Shien Mor, Kuo-Tai Huang | 2024-06-18 |
| 12002766 | Semiconductor structure having isolations between fins and comprising materials with different thermal expansion coefficients (CTE) | Yuan-Sheng Huang | 2024-06-04 |
| 11996466 | Semiconductor device and method of manufacture | Chen-Huang Huang, Ming-Jhe Sie, Cheng-Chung Chang, Shao-Hua Hsu, Shu-Uei Jang +2 more | 2024-05-28 |
| 11990341 | Cut metal gate processes | Shu-Uei Jang, Ya-Yi Tsai, An Chyi Wei, Shu-Yuan Ku | 2024-05-21 |
| 11961919 | Nanostructure field-effect transistor device and method of forming | Cheng-Chung Chang, Hsiu-Hao Tsao, Ming-Jhe Sie, Shun-Hui Yang, Chen-Huang Huang +1 more | 2024-04-16 |
| 11942532 | Fin field-effect transistor and method of forming the same | Chao-Hsuan Chen, Ming-Chia Tai, Yu-Hsien Lin, Shun-Hui Yang | 2024-03-26 |
| 11923359 | Method for forming fin field effect transistor (FinFET) device structure | Chung-Shu Wu, Shu-Uei Jang, Wei-Yeh TANG, An Chyi Wei | 2024-03-05 |
| 11915980 | Residue-free metal gate cutting for fin-like field effect transistor | Ya-Yi Tsai, Yi-Hsuan Hsiao, Shu-Yuan Ku, Ming-Ching Chang | 2024-02-27 |