Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7722997 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin +1 more | 2010-05-25 |
| 7697114 | Method and apparatus for compensated illumination for advanced lithography | Shih-Ming Chang, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin, Hung-Chang Hsieh | 2010-04-13 |
| 7651824 | Method for compensating critical dimension variations in photomasks | Hsuan-Ko Chen, Mei-Li Wang, Pei Cheng Fan | 2010-01-26 |
| 7383530 | System and method for examining mask pattern fidelity | Wen-Chuan Wang, Shih-Ming Chang, Chi-Lun Lu, Sheng-Chi Chin, Hung-Chang Hsieh | 2008-06-03 |
| 7316872 | Etching bias reduction | Shih-Ming Chang, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin | 2008-01-08 |
| 7312021 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Wen-Chuan Wang, Chi-Lun Lu, Sheng-Chi Chin +1 more | 2007-12-25 |
| 7005219 | Defect repair method employing non-defective pattern overlay and photoexposure | Shih-Ming Chang | 2006-02-28 |
| 6982135 | Pattern compensation for stitching | Chung-Hsing Chang, Chien-Hung Lin, Burn Jeng Lin, Chia-Hui Lin, Chin-Hsiang Lin +3 more | 2006-01-03 |
| 6653029 | Dual-focused ion beams for semiconductor image scanning and mask repair | Chuan-Yuan Lin, Chang-Cheng Hung, Chin-Hsiang Lin | 2003-11-25 |