Issued Patents All Time
Showing 1–25 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Anthony Yen | 2025-09-30 |
| 12320782 | Acoustic measurement of fabrication equipment clearance | Jun DENG, Kuan-Wen Lin, Yu-Ching Lee | 2025-06-03 |
| 11709153 | Acoustic measurement of fabrication equipment clearance | Jun DENG, Kuan-Wen Lin, Yu-Ching Lee | 2023-07-25 |
| 11079669 | System and method for localized EUV pellicle glue removal | Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Ting-Hao Hsu | 2021-08-03 |
| 10955746 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Anthony Yen | 2021-03-23 |
| 10859908 | Method to fabricate mask-pellicle system | Chun-Hao Tseng, Yuan-Chih Chu | 2020-12-08 |
| 10845342 | Acoustic measurement of film thickness | Jun DENG, Kuan-Wen Lin, Yu-Ching Lee | 2020-11-24 |
| 10794872 | Acoustic measurement of fabrication equipment clearance | Jun DENG, Kuan-Wen Lin, Yu-Ching Lee | 2020-10-06 |
| 10691017 | Pellicle for advanced lithography | Yu-Ching Lee, Ching-Fang Yu, Chun-Hung Lin, Ting-Hao Hsu, Ching-Hsiang Chang | 2020-06-23 |
| 10520805 | System and method for localized EUV pellicle glue removal | Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Ting-Hao Hsu | 2019-12-31 |
| 10126644 | Pellicle for advanced lithography | Yu-Ching Lee, Ching-Fang Yu, Chun-Hung Lin, Ting-Hao Hsu, Ching-Hsiang Chang | 2018-11-13 |
| 10061193 | Focused radiation beam induced deposition | Hsun-Chuan Shih, Yuan-Chih Chu, Yueh-Hsun Li | 2018-08-28 |
| 9933699 | Pellicle aging estimation and particle removal from pellicle via acoustic waves | Yu-Ching Lee, Ching-Fang Yu, Chun-Hung Lin, Ting-Hao Hsu, Mark Chang | 2018-04-03 |
| 9915866 | Focused radiation beam induced deposition | Hsun-Chuan Shih, Yuan-Chih Chu, Yueh-Hsun Li | 2018-03-13 |
| 9910350 | Method for repairing a mask | Shang-Lun Tsai, Yuan-Chih Chu, Yueh-Hsun Li | 2018-03-06 |
| 9889477 | Method and apparatus for enhanced cleaning and inspection | Chi-Lun Lu | 2018-02-13 |
| 9870612 | Method for repairing a mask | Shinn-Sheng Yu, Anthony Yen, Wen-Chuan Wang | 2018-01-16 |
| 9835940 | Method to fabricate mask-pellicle system | Chun-Hao Tseng, Yuan-Chih Chu | 2017-12-05 |
| 9658526 | Mask pellicle indicator for haze prevention | Kuan-Wen Lin, Ting-Hao Hsu, Tzu-Ting Chou, Shu-Hsien Wu | 2017-05-23 |
| 9418847 | Lithography system and method for haze elimination | Ching-Wei Shen, Kuan-Wen Lin, Chi-Lun Lu, Ting-Hao Hsu, Anthony Yen | 2016-08-16 |
| 9354510 | EUV mask and method for forming the same | Ching-Fang Yu, Ting-Hao Hsu | 2016-05-31 |
| 9152035 | Lithographic photomask with inclined sides | Ching-Fang Yu, Ting-Hao Hsu | 2015-10-06 |
| 9138785 | Method and apparatus for enhanced cleaning and inspection | Chi-Lun Lu | 2015-09-22 |
| 8932958 | Device manufacturing and cleaning method | Chi-Lun Lu, Kuan-Wen Lin, Ching-Wei Shen, Ting-Hao Hsu | 2015-01-13 |
| 8906583 | Stacked mask | Burn Jeng Lin, Hsin-Chang Lee | 2014-12-09 |