Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8758963 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Wen-Chuan Wang, Chi-Lun Lu, Chin-Hsiang Lin +1 more | 2014-06-24 |
| 8737717 | Method and apparatus for defect identification | Mei-Chun Lin, Ching-Fang Yu, Ting-Hao Hsu | 2014-05-27 |
| 8709682 | Mask and method for forming the mask | Chia-Jen Chen, Anthony Yen, Hsin-Chang Lee | 2014-04-29 |
| 8691476 | EUV mask and method for forming the same | Ching-Fang Yu, Ting-Hao Hsu | 2014-04-08 |
| 8656318 | System and method for combined intraoverlay metrology and defect inspection | Hsin-Chang Lee, Chia-Jen Chen, Yeh Lee-Chih, Ting-Hao Hsu, Anthony Yen | 2014-02-18 |
| 8626580 | Coupon-point system for managing supportive services to business in a semiconductor foundry environment | Shouh-Dauh Fred Lin, Lawrence Shao-hsien Chen, Chun-Mai Liu, Huang-Sheng Lin | 2014-01-07 |
| 8609545 | Method to improve mask critical dimension uniformity (CDU) | I-Hsiung Huang, Chi-Lin Lu, Heng-Jen Lee, Yao-Ching Ku | 2013-12-17 |
| 8598042 | Device manufacturing and cleaning method | Chi-Lun Lu, Kuan-Wen Lin, Ching-Wei Shen, Ting-Hao Hsu | 2013-12-03 |
| 8227150 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Wen-Chuan Wang, Chi-Lun Lu, Chin-Hsiang Lin +1 more | 2012-07-24 |
| 7999910 | System and method for manufacturing a mask for semiconductor processing | Chia-Jen Chen, Hsin-Chang Lee, Hung-Chang Hsieh, Burn Jeng Lin | 2011-08-16 |
| 7722997 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu +1 more | 2010-05-25 |
| 7697114 | Method and apparatus for compensated illumination for advanced lithography | Shih-Ming Chang, Wen-Chuan Wang, Chih-Cheng Chin, Chi-Lun Lu, Hung-Chang Hsieh | 2010-04-13 |
| 7381344 | Method to reduce particle level for dry-etch | Shy-Jay Lin | 2008-06-03 |
| 7383530 | System and method for examining mask pattern fidelity | Wen-Chuan Wang, Shih-Ming Chang, Chih-Cheng Chin, Chi-Lun Lu, Hung-Chang Hsieh | 2008-06-03 |
| 7316872 | Etching bias reduction | Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu | 2008-01-08 |
| 7312021 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Chih-Cheng Chin, Wen-Chuan Wang, Chi-Lun Lu +1 more | 2007-12-25 |
| 7060400 | Method to improve photomask critical dimension uniformity and photomask fabrication process | Wen-Chuan Wang, Shih-Ming Chang, Chih-Chen Chin, Chi-Lun Lu, Hung-Chang Hsieh | 2006-06-13 |
| 6830853 | Chrome mask dry etching process to reduce loading effect and defects | San-De Tzu, Chung-Hsing Chang, Hsin-Chang Li | 2004-12-14 |
| 6599665 | Method of making a semiconductor wafer imaging mask having uniform pattern features | Shy-Jay Lin | 2003-07-29 |
| 6428938 | Phase-shift mask for printing high-resolution images and a method of fabrication | Chin-Hsiang Lin, Shy-Jay Lin, Wei-Zen Chou | 2002-08-06 |