Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10747103 | Pellicle fabrication methods and structures thereof | Yun-Yue Lin, Hsuan-Chen Chen, Chih-Cheng Lin, Hsin-Chang Lee, Wei-Jen Lo +3 more | 2020-08-18 |
| 10162258 | Pellicle fabrication methods and structures thereof | Yun-Yue Lin, Hsuan-Chen Chen, Chih-Cheng Lin, Hsin-Chang Lee, Wei-Jen Lo +3 more | 2018-12-25 |
| 10163738 | Structure and method for overlay marks | Hsien-Cheng Wang, Ming-Chang Wen, Chun-Kuang Chen | 2018-12-25 |
| 9543406 | Structure and method for overlay marks | Hsien-Cheng Wang, Ming-Chang Wen, Chun-Kuang Chen | 2017-01-10 |
| 9026957 | Method of defining an intensity selective exposure photomask | Chia-Chu Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2015-05-05 |
| 8987008 | Integrated circuit layout and method with double patterning | Ming-Feng Shieh, Ru-Gun Liu, Hung-Chang Hsieh, Tsai-Sheng Gau | 2015-03-24 |
| 8673520 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2014-03-18 |
| 8609545 | Method to improve mask critical dimension uniformity (CDU) | I-Hsiung Huang, Chi-Lin Lu, Heng-Jen Lee, Sheng-Chi Chin | 2013-12-17 |
| 8431291 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2013-04-30 |
| 8375347 | Driven metal critical dimension (CD) biasing | Louis Liu, Lee-Chung Lu | 2013-02-12 |
| 8352888 | Model import for electronic design automation | Ru-Gun Liu, Chih-Ming Lai, Wen-Chun Huang, Boren Luo, I-Chang Shin +1 more | 2013-01-08 |
| 8214772 | Model import for electronic design automation | Ru-Gun Liu, Chih-Ming Lai, Wen-Chun Huang, Boren Luo, I-Chang Shin +1 more | 2012-07-03 |
| 8201111 | Table-based DFM for accurate post-layout analysis | Yung-Chin Hou, Ying-Chou Cheng, Ru-Gun Liu, Chih-Ming Lai, Yi-Kan Cheng +5 more | 2012-06-12 |
| 8037575 | Method for shape and timing equivalent dimension extraction | Ying-Chou Cheng, Chih-Ming Lai, Ru-Gun Liu, Tsong-Hua Ou, Min-Hong Wu +4 more | 2011-10-18 |
| 8001494 | Table-based DFM for accurate post-layout analysis | Yung-Chin Hou, Ying-Chou Cheng, Ru-Gun Liu, Chih-Ming Lai, Yi-Kan Cheng +5 more | 2011-08-16 |
| 7954072 | Model import for electronic design automation | Ru-Gun Liu, Chih-Ming Lai, Wen-Chun Huang, Boren Luo, I-Chang Shin +1 more | 2011-05-31 |
| 7783999 | Electrical parameter extraction for integrated circuit design | Tsong-Hua Ou, Ying-Chou Cheng, Chia-Chi Lin, Ru-Gun Liu, Chih-Ming Lai +3 more | 2010-08-24 |
| 7778805 | Regression system and methods for optical proximity correction modeling | Wen-Chun Huang, Ru-Gun Liu, Chih-Ming Lai, Chen Kun Tsai, Chien-Wen Lai +2 more | 2010-08-17 |
| 7727682 | System and method for providing phase shift mask passivation layer | Hung-Ting Pan, Ken Wu, Luke Hsu | 2010-06-01 |
| 7685558 | Method for detection and scoring of hot spots in a design layout | Chih-Ming Lai, Ru-Gun Liu, I-Chang Shin, Cliff Hou | 2010-03-23 |
| 7387969 | Top patterned hardmask and method for patterning | George Liu, Vencent Chang, Norman Chen, Chin-Hsiang Lin, Kuei-Shun Chen | 2008-06-17 |
| 7314689 | System and method for processing masks with oblique features | Burn Jeng Lin, Ping-Che YANG, Hong-Chang Hsieh, Chin Hsian Lin, Chiu-Shan Yoo | 2008-01-01 |
| 7218400 | In-situ overlay alignment | Grace H. Ho, Ming-Che Wu, Li-Heng Chou, Hung-Chang Hsieh, Jung-Ting Chen | 2007-05-15 |
| 6979820 | CD SEM automatic focus methodology and apparatus for constant electron beam dosage control | Chih-Ming Ke, Chien-Hsun Lin | 2005-12-27 |
| 6492073 | Removal of line end shortening in microlithography and mask set for removal | Burn Jeng Lin, Ru-Gun Liu, Shih-Ying Chen, Shinn-Sheng Yu, Hua-Tai Lin +1 more | 2002-12-10 |