Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7314689 | System and method for processing masks with oblique features | Burn Jeng Lin, Ping-Che YANG, Hong-Chang Hsieh, Yao-Ching Ku, Chin Hsian Lin | 2008-01-01 |
| 7251015 | Photolithography mask critical dimension metrology system and method | — | 2007-07-31 |