Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8624345 | Photomask and photomask substrate with reduced light scattering properties | Ken Wu, Hung-Chang Hsieh, Chang-Cheng Hung, Ren-Guey Hsieh, Hsin-Chang Lee +1 more | 2014-01-07 |
| 8198118 | Method for forming a robust mask with reduced light scattering | Ken Wu, Hung-Chang Hsieh, Chang-Cheng Hung, Ren-Guey Hsieh, Hsin-Chang Lee +1 more | 2012-06-12 |
| 7727682 | System and method for providing phase shift mask passivation layer | Hung-Ting Pan, Ken Wu, Yao-Ching Ku | 2010-06-01 |