Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8624345 | Photomask and photomask substrate with reduced light scattering properties | Ken Wu, Hung-Chang Hsieh, Chang-Cheng Hung, Luke Hsu, Hsin-Chang Lee +1 more | 2014-01-07 |
| 8198118 | Method for forming a robust mask with reduced light scattering | Ken Wu, Hung-Chang Hsieh, Chang-Cheng Hung, Luke Hsu, Hsin-Chang Lee +1 more | 2012-06-12 |
| 7011926 | Gap forming pattern fracturing method for forming optical proximity corrected masking layer | — | 2006-03-14 |
| 6861179 | Charge effect and electrostatic damage prevention method on photo-mask | Chang-Cheng Hung, Jaw-Jung Shin | 2005-03-01 |
| 6737199 | Using new pattern fracturing rules for optical proximity correction mask-making to improve critical dimension uniformity | — | 2004-05-18 |
| 6660439 | Method to reduce data size and data preparation time for optical proximity correction of photo masks | — | 2003-12-09 |
| 6311319 | Solving line-end shortening and corner rounding problems by using a simple checking rule | Chih-Chiang Tu | 2001-10-30 |