Issued Patents All Time
Showing 1–25 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11670541 | Methods of manufacturing semiconductor device using phase shift mask | Chun-Chieh Wang, Hung-Jui Kuo, Ming-Tan Lee | 2023-06-06 |
| 11189521 | Methods of manufacturing redistribution circuit structures using phase shift mask | Chun-Chieh Wang, Hung-Jui Kuo, Ming-Tan Lee | 2021-11-30 |
| 9911575 | Apparatus for charged particle lithography system | Shih-Chi Wang, Tsung-Chih Chien, Hui-Min Huang, Shy-Jay Lin, Burn Jeng Lin | 2018-03-06 |
| 9810994 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Shy-Jay Lin, Wen-Chuan Wang | 2017-11-07 |
| 9678434 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Pei-Yi Liu, Shy-Jay Lin | 2017-06-13 |
| 9538628 | Method for EUV power improvement with fuel droplet trajectory stabilization | Tsiao-Chen Wu | 2017-01-03 |
| 9529271 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Pei-Yi Liu, Shy-Jay Lin | 2016-12-27 |
| 9519225 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Shy-Jay Lin, Wen-Chuan Wang | 2016-12-13 |
| 9390891 | Apparatus for charged particle lithography system | Shih-Chi Wang, Tsung-Chih Chien, Hui-Min Huang, Shy-Jay Lin, Burn Jeng Lin | 2016-07-12 |
| 9329488 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2016-05-03 |
| 9291913 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Shy-Jay Lin, Burn Jeng Lin | 2016-03-22 |
| 9229332 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Shy-Jay Lin, Wen-Chuan Wang | 2016-01-05 |
| 9182660 | Methods for electron beam patterning | Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2015-11-10 |
| 9176389 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2015-11-03 |
| 9147377 | Method for image dithering for lithographic processes | Cheng-Hung Chen, Shy-Jay Shin, Burn Jeng Lin | 2015-09-29 |
| 9134627 | Multiple-patterning overlay decoupling method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2015-09-15 |
| 9001308 | Pattern generator for a lithography system | Chen-Hua Yu, Tien-I Bao, Chih Wei Lu, Shy-Jay Lin, Burn Jeng Lin | 2015-04-07 |
| 8984452 | Long-range lithographic dose correction | Cheng-Hung Chen, Shy-Jay Lin, Wen-Chuan Wang, Pei-Yi Liu, Burn Jeng Lin | 2015-03-17 |
| 8972908 | Method for electron beam proximity correction with improved critical dimension accuracy | Cheng-Hung Chen, Shy-Jay Lin, Wen-Chuan Wang, Pei-Yi Liu, Burn Jeng Lin | 2015-03-03 |
| 8927947 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2015-01-06 |
| 8852849 | Electron beam lithography system and method for improving throughput | Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin | 2014-10-07 |
| 8846278 | Electron beam lithography system and method for improving throughput | Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin | 2014-09-30 |
| 8828632 | Multiple-grid exposure method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2014-09-09 |
| 8822106 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2014-09-02 |
| 8822107 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2014-09-02 |