Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12166096 | Semiconductor device structure with uneven gate profile | Chi-Sheng Lai, Yu-Fan Peng, Li Chen, Yu-Shan Lu, Yu-Bey Wu +6 more | 2024-12-10 |
| 11631745 | Semiconductor device structure with uneven gate profile | Chi-Sheng Lai, Yu-Fan Peng, Li Chen, Yu-Shan Lu, Yu-Bey Wu +6 more | 2023-04-18 |
| 11061317 | Method of fabricating an integrated circuit with non-printable dummy features | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2021-07-13 |
| 10811225 | Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2020-10-20 |
| 10795057 | Composition for manufacturing contact lenses | Fan-Dan Jan | 2020-10-06 |
| 10431423 | Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2019-10-01 |
| 10359695 | Method of fabricating an integrated circuit with non-printable dummy features | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2019-07-23 |
| 10356802 | Base station and scheduling method of uplink resource unit | Kun-Ru Wu, Jia-Ming Liang, Jen-Jee Chen, Yu-Chee Tseng | 2019-07-16 |
| 10170276 | Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2019-01-01 |
| 9958578 | Composition for manufacturing contact lenses and method for manufacturing contact lenses by using the same | Fan-Dan Jan | 2018-05-01 |
| 9703009 | Material for contact lenses, contact lenses and method of forming the same | Fan-Dan Jan | 2017-07-11 |
| 9678434 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Shy-Jay Lin | 2017-06-13 |
| 9658538 | System and technique for rasterizing circuit layout data | Cheng-Chi Wu, Cheng-Hung Chen, Jyuh-Fuh Lin, Wen-Chuan Wang, Shy-Jay Lin | 2017-05-23 |
| 9594862 | Method of fabricating an integrated circuit with non-printable dummy features | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2017-03-14 |
| 9552964 | Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2017-01-24 |
| 9529271 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Shy-Jay Lin | 2016-12-27 |
| 9436788 | Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2016-09-06 |
| 9436787 | Method of fabricating an integrated circuit with optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2016-09-06 |
| 9329488 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin, Burn Jeng Lin | 2016-05-03 |
| 9176389 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin, Burn Jeng Lin | 2015-11-03 |
| 9134627 | Multiple-patterning overlay decoupling method | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin, Burn Jeng Lin | 2015-09-15 |
| 8984452 | Long-range lithographic dose correction | Cheng-Hung Chen, Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang, Burn Jeng Lin | 2015-03-17 |
| 8972908 | Method for electron beam proximity correction with improved critical dimension accuracy | Cheng-Hung Chen, Jaw-Jung Shin, Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin | 2015-03-03 |
| 8828632 | Multiple-grid exposure method | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin, Burn Jeng Lin | 2014-09-09 |
| 8822107 | Grid refinement method | Wen-Chuan Wang, Shy-Jay Lin, Jaw-Jung Shin, Burn Jeng Lin | 2014-09-02 |