Issued Patents All Time
Showing 26–43 of 43 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8762900 | Method for proximity correction | Shy-Jay Lin, Hua-Tai Lin, Burn Jeng Lin | 2014-06-24 |
| 8722286 | Devices and methods for improved reflective electron beam lithography | Chen-Hua Yu, Shy-Jay Lin, Burn Jeng Lin | 2014-05-13 |
| 8610083 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2013-12-17 |
| 8584057 | Non-directional dithering methods | Pei-Yi Liu, Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin | 2013-11-12 |
| 8530121 | Multiple-grid exposure method | Wen-Chuan Wang, Shy-Jay Lin, Pei-Yi Liu, Burn Jeng Lin | 2013-09-10 |
| 8524427 | Electron beam lithography system and method for improving throughput | Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin | 2013-09-03 |
| 8510687 | Error diffusion and grid shift in lithography | Pei-Yi Liu, Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin | 2013-08-13 |
| 8368037 | Systems and methods providing electron beam writing to a medium | Wen-Chuan Wang, Shy-Jay Lin, Burn Jeng Lin | 2013-02-05 |
| 7934177 | Method and system for a pattern layout split | King-Chang Shu, Tsai-Sheng Gau, Burn Jeng Lin | 2011-04-26 |
| 7643976 | Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip | King-Chang Shu, Jan-Wen You, Tsai-Sheng Gau | 2010-01-05 |
| 7266803 | Layout generation and optimization to improve photolithographic performance | Shou-Yen Chou, Tsai-Sheng Gau, Burn Jeng Lin | 2007-09-04 |
| 7252909 | Method to reduce CD non-uniformity in IC manufacturing | Chih-Ming Ke, Burn Jeng Lin | 2007-08-07 |
| 7234128 | Method for improving the critical dimension uniformity of patterned features on wafers | Tsai-Sheng Gau, Jan-Wen You, Burn Jeng Lin | 2007-06-19 |
| 7175941 | Phase shift assignments for alternate PSM | Jan-Wen You | 2007-02-13 |
| 7057299 | Alignment mark configuration | Liang-Gi Yao | 2006-06-06 |
| 6973636 | Method of defining forbidden pitches for a lithography exposure tool | Chun-Kuang Chen, Tsai-Sheng Gau, Burn Jeng Lin, Li-Chun Tien, Mi-Chang Chang +4 more | 2005-12-06 |
| 6861179 | Charge effect and electrostatic damage prevention method on photo-mask | Ren-Guey Hsieh, Chang-Cheng Hung | 2005-03-01 |
| 6774044 | Reducing photoresist shrinkage via plasma treatment | Chih-Ming Ke, Tsai-Sheng Giau, Anthony Yen | 2004-08-10 |