Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7643976 | Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip | Jaw-Jung Shin, King-Chang Shu, Tsai-Sheng Gau | 2010-01-05 |
| 7474788 | Method and system for enhancing image resolution using a modification vector | Shih-Ming Chang, Wen-Chuan Wang | 2009-01-06 |
| 7234128 | Method for improving the critical dimension uniformity of patterned features on wafers | Tsai-Sheng Gau, Jaw-Jung Shin, Burn Jeng Lin | 2007-06-19 |
| 7175941 | Phase shift assignments for alternate PSM | Jaw-Jung Shin | 2007-02-13 |
| 7131102 | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era | Chang-Ming Dai, Chung-Hsing Chang, Burn Jeng Lin | 2006-10-31 |
| 7036108 | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era | Chang-Ming Dai, Chung-Hsing Chang, Burn Jeng Lin | 2006-04-25 |
| 7013453 | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA | Chang-Ming Dai, Chung-Hsing Chang, Burn Jeng Lin | 2006-03-14 |
| 6973636 | Method of defining forbidden pitches for a lithography exposure tool | Jaw-Jung Shin, Chun-Kuang Chen, Tsai-Sheng Gau, Burn Jeng Lin, Li-Chun Tien +4 more | 2005-12-06 |
| 6711732 | Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era | Chang-Ming Dai, Chung-Hsing Chang, Burn Jeng Lin | 2004-03-23 |