Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Sheng-Chi Chin, Anthony Yen | 2025-09-30 |
| 12393124 | High throughput and high position accurate method for particle inspection of mask pods | Shih-Jui Huang, ShinAn KU, Hsin-Chang Lee | 2025-08-19 |
| 12140857 | Method of fast surface particle and scratch detection for EUV mask backside | Chih-Cheng Chen, ShinAn KU, Hsin-Chang Lee | 2024-11-12 |
| 12013646 | High throughput and high position accurate method for particle inspection of mask pods | Shih-Jui Huang, ShinAn KU, Hsin-Chang Lee | 2024-06-18 |
| 11855099 | Metal-insulator-semiconductor tunnel diode memory | Jenn-Gwo Hwu | 2023-12-26 |
| 11768431 | Method of fast surface particle and scratch detection for EUV mask backside | Chih-Cheng Chen, ShinAn KU, Hsin-Chang Lee | 2023-09-26 |
| 11722099 | Semiconductor device and operation method thereof | Jenn-Gwo Hwu | 2023-08-08 |
| 11614691 | High throughput and high position accurate method for particle inspection of mask pods | Shih-Jui Huang, ShinAn KU, Hsin-Chang Lee | 2023-03-28 |
| 11591039 | Bicycle head and bicycle shift control box | Bo-Yi Liao, Chia-Hao Yang | 2023-02-28 |
| 11411535 | Semiconductor device and operation method thereof | Jenn-Gwo Hwu | 2022-08-09 |
| 11079669 | System and method for localized EUV pellicle glue removal | Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Sheng-Chi Chin | 2021-08-03 |
| 10955746 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Sheng-Chi Chin, Anthony Yen | 2021-03-23 |
| 10958216 | Semiconductor device and operation method thereof | Jenn-Gwo Hwu | 2021-03-23 |
| 10691017 | Pellicle for advanced lithography | Yu-Ching Lee, Ching-Fang Yu, Chun-Hung Lin, Ching-Hsiang Chang, Sheng-Chi Chin | 2020-06-23 |
| 10520805 | System and method for localized EUV pellicle glue removal | Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Sheng-Chi Chin | 2019-12-31 |
| 10126644 | Pellicle for advanced lithography | Yu-Ching Lee, Ching-Fang Yu, Chun-Hung Lin, Ching-Hsiang Chang, Sheng-Chi Chin | 2018-11-13 |
| 9933699 | Pellicle aging estimation and particle removal from pellicle via acoustic waves | Yu-Ching Lee, Ching-Fang Yu, Chun-Hung Lin, Sheng-Chi Chin, Mark Chang | 2018-04-03 |
| 9658526 | Mask pellicle indicator for haze prevention | Kuan-Wen Lin, Sheng-Chi Chin, Tzu-Ting Chou, Shu-Hsien Wu | 2017-05-23 |
| 9548209 | Method for integrated circuit fabrication | Ching-Fang Yu, Chia-Ching Huang | 2017-01-17 |
| 9418847 | Lithography system and method for haze elimination | Ching-Wei Shen, Kuan-Wen Lin, Chi-Lun Lu, Sheng-Chi Chin, Anthony Yen | 2016-08-16 |
| 9354510 | EUV mask and method for forming the same | Ching-Fang Yu, Sheng-Chi Chin | 2016-05-31 |
| 9305346 | Method and apparatus for efficient defect inspection | Ching-Fang Yu | 2016-04-05 |
| 9152035 | Lithographic photomask with inclined sides | Ching-Fang Yu, Sheng-Chi Chin | 2015-10-06 |
| 8980108 | Method for integrated circuit fabrication | Ching-Fang Yu, Chia-Ching Huang | 2015-03-17 |
| 8932958 | Device manufacturing and cleaning method | Chi-Lun Lu, Kuan-Wen Lin, Ching-Wei Shen, Sheng-Chi Chin | 2015-01-13 |