Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12353120 | EUV photo masks and manufacturing method thereof | Wei-Che Hsieh, Ping-Hsun Lin, Fu-Sheng Chu, Ta-Cheng Lien, Hsin-Chang Lee | 2025-07-08 |
| 12276906 | Methods for cleaning lithography mask | I-Hsiung Huang, Yung-Cheng Chen | 2025-04-15 |
| 11822230 | EUV pellicle and mounting method thereof on photo mask | Wen-Yao Wei, Hsin-Chang Lee | 2023-11-21 |
| 11378894 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh +3 more | 2022-07-05 |
| 11079669 | System and method for localized EUV pellicle glue removal | Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Ting-Hao Hsu, Sheng-Chi Chin | 2021-08-03 |
| 11003069 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chih-Tsung Shih, Ching-Wei Shen, Jeng-Horng Chen | 2021-05-11 |
| 10642148 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chih-Tsung Shih, Ching-Wei Shen, Jeng-Horng Chen | 2020-05-05 |
| 10520805 | System and method for localized EUV pellicle glue removal | Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Ting-Hao Hsu, Sheng-Chi Chin | 2019-12-31 |
| 10459353 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh +3 more | 2019-10-29 |
| 10156784 | Systems and methods of EUV mask cleaning | Ching-Wei Shen, Kuan-Wen Lin | 2018-12-18 |
| 10067418 | Particle removal system and method thereof | Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien, Jui-Ching Wu, Jeng-Horng Chen +2 more | 2018-09-04 |
| 10061191 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chih-Tsung Shih, Ching-Wei Shen, Jeng-Horng Chen | 2018-08-28 |
| 9889477 | Method and apparatus for enhanced cleaning and inspection | Sheng-Chi Chin | 2018-02-13 |
| 9885952 | Systems and methods of EUV mask cleaning | Ching-Wei Shen, Kuan-Wen Lin | 2018-02-06 |
| 9740094 | Damage prevention on EUV mask | Kuan-Wen Lin, Ching-Wei Shen, Shu-Hsien Wu | 2017-08-22 |
| 9665000 | Method and system for EUV mask cleaning with non-thermal solution | Ching-Wei Shen, Kuan-Wen Lin | 2017-05-30 |
| 9612523 | Structure and method for reflective-type mask | Chih-Tsung Shih, Jeng-Horng Chen, Chia-Chen Chen, Shinn-Sheng Yu, Anthony Yen +1 more | 2017-04-04 |
| 9418847 | Lithography system and method for haze elimination | Ching-Wei Shen, Kuan-Wen Lin, Ting-Hao Hsu, Sheng-Chi Chin, Anthony Yen | 2016-08-16 |
| 9138785 | Method and apparatus for enhanced cleaning and inspection | Sheng-Chi Chin | 2015-09-22 |
| 9046781 | Structure and method for reflective-type mask | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen, Wei Liu, Chia-Chen Chen +1 more | 2015-06-02 |
| 8932958 | Device manufacturing and cleaning method | Kuan-Wen Lin, Ching-Wei Shen, Ting-Hao Hsu, Sheng-Chi Chin | 2015-01-13 |
| 8888948 | Apparatus and method for controlling relative particle concentrations in a plasma | Shih-Ming Chang | 2014-11-18 |
| 8758963 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Wen-Chuan Wang, Sheng-Chi Chin, Chin-Hsiang Lin +1 more | 2014-06-24 |
| 8598042 | Device manufacturing and cleaning method | Kuan-Wen Lin, Ching-Wei Shen, Ting-Hao Hsu, Sheng-Chi Chin | 2013-12-03 |
| 8282850 | Apparatus and method for controlling relative particle concentrations in a plasma | Shih-Ming Chang | 2012-10-09 |