Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8227150 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Wen-Chuan Wang, Sheng-Chi Chin, Chin-Hsiang Lin +1 more | 2012-07-24 |
| 8046860 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Shih-Ming Chang, Wen-Chuan Wang, Yen-Bin Huang +2 more | 2011-11-01 |
| 7897008 | Apparatus and method for regional plasma control | Shih-Ming Chang | 2011-03-01 |
| 7883601 | Apparatus and method for controlling relative particle speeds in a plasma | Shih-Ming Chang | 2011-02-08 |
| 7819980 | System and method for removing particles in semiconductor manufacturing | Chen-Yuan Hsia, Chang-Cheng Hung, Shih-Ming Chang, Wen-Chuan Wang, Yen-Bin Huang +2 more | 2010-10-26 |
| 7759136 | Critical dimension (CD) control by spectrum metrology | Chang-Cheng Hung, Hung-Chang Hsieh, Shih-Ming Chang, Wen-Chuan Wang, Allen Hsia +1 more | 2010-07-20 |
| 7722997 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Chih-Cheng Chin, Wen-Chuan Wang, Sheng-Chi Chin +1 more | 2010-05-25 |
| 7697114 | Method and apparatus for compensated illumination for advanced lithography | Shih-Ming Chang, Wen-Chuan Wang, Chih-Cheng Chin, Sheng-Chi Chin, Hung-Chang Hsieh | 2010-04-13 |
| 7460251 | Dimension monitoring method and system | Shih-Ming Chang, Chen-Yuan Hsia, Wen-Chuan Wang, Yen-Bin Huang, Chang-Cheng Hung +4 more | 2008-12-02 |
| 7383530 | System and method for examining mask pattern fidelity | Wen-Chuan Wang, Shih-Ming Chang, Chih-Cheng Chin, Sheng-Chi Chin, Hung-Chang Hsieh | 2008-06-03 |
| 7316872 | Etching bias reduction | Shih-Ming Chang, Chih-Cheng Chin, Wen-Chuan Wang, Sheng-Chi Chin | 2008-01-08 |
| 7312021 | Holographic reticle and patterning method | Shih-Ming Chang, Chung-Hsing Chang, Chih-Cheng Chin, Wen-Chuan Wang, Sheng-Chi Chin +1 more | 2007-12-25 |
| 7060400 | Method to improve photomask critical dimension uniformity and photomask fabrication process | Wen-Chuan Wang, Shih-Ming Chang, Chih-Chen Chin, Sheng-Chi Chin, Hung-Chang Hsieh | 2006-06-13 |