FT

Fei-Gwo Tsai

TSMC: 31 patents #1,094 of 12,232Top 9%
Overall (All Time): #117,003 of 4,157,543Top 3%
31
Patents All Time

Issued Patents All Time

Showing 1–25 of 31 patents

Patent #TitleCo-InventorsDate
12027407 Substrate support apparatus and method Yueh-Lin Yang, Chi-Hung Liao 2024-07-02
11940737 Method of fabricating reticle Hsueh-Yi Chung, Yung-Cheng Chen, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu +4 more 2024-03-26
11150558 Developing method Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Li-Kong Turn 2021-10-19
11003091 Method of fabricating reticle Hsueh-Yi Chung, Yung-Cheng Chen, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu +4 more 2021-05-11
10627718 Developing method Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Li-Kong Turn 2020-04-21
10534272 Method of fabricating reticle Hsueh-Yi Chung, Yung-Cheng Chen, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu +4 more 2020-01-14
10101662 Developing method Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Li-Kong Turn 2018-10-16
10073354 Exposure method of wafer substrate, manufacturing method of semiconductor device, and exposure tool Hsueh-Yi Chung, Yung-Cheng Chen, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu +4 more 2018-09-11
9908201 Systems and methods for edge bead removal Chun-Hao Chang, Hsueh-Yi Chung, Shang-Yun HUANG, Jui-Ping Chuang, Li-Kong Turn 2018-03-06
9733568 Tool and method of developing Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Li-Kong Turn 2017-08-15
9618855 Lithography system and method for mask inspection Bo-Tsun Liu, Chieh-Huan Ku 2017-04-11
9466101 Detection of defects on wafer during semiconductor fabrication Chun-Hsien Lin, Liu Bo-Tsun, Chin-Ti Ko, Wu Cheng-Hung, Kuo-Hung Chao +3 more 2016-10-11
9188876 Method of determining overlay error and control system for dynamic control of reticle position Yung-Yao Lee, Sophia Wang, Heng-Hsin Liu 2015-11-17
9081306 Method of optimizing lithography tools utilization Yao-Hwan Kao, Li-Kong Tum, Ching-Hai Yang, Steven Liu 2015-07-14
8709267 Double patterning method using tilt-angle deposition Chwen Yu, Kai-Wen Cheng 2014-04-29
8624338 Multi-nanometer-projection apparatus for lithography, oxidation, inspection, and measurement Chwen Yu 2014-01-07
8202681 Hybrid multi-layer mask Feng-Lung Lin, Kuan-Liang Wu, Che-Rong Liang 2012-06-19
8007966 Multiple technology node mask Feng-Lung Lin, Kuan-Liang Wu, Che-Rong Liang 2011-08-30
8003281 Hybrid multi-layer mask Feng-Lung Lin, Kuan-Liang Wu, Che-Rong Liang 2011-08-23
7875406 Multiple technology node mask Feng-Lung Lin, Kuan-Liang Wu, Che-Rong Liang 2011-01-25
7871742 Method for controlling phase angle of a mask by post-treatment Chun-Lang Chen, Tran-Hui Shen, Chien-Chao Huang 2011-01-18
7368229 Composite layer method for minimizing PED effect Chun-Lang Chen 2008-05-06
7244533 Method of the adjustable matching map system in lithography 2007-07-17
7241541 Method of the adjustable matching map system in lithography 2007-07-10
7160654 Method of the adjustable matching map system in lithography 2007-01-09