Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11150558 | Developing method | Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Fei-Gwo Tsai | 2021-10-19 |
| 10627718 | Developing method | Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Fei-Gwo Tsai | 2020-04-21 |
| 10101662 | Developing method | Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Fei-Gwo Tsai | 2018-10-16 |
| 9908201 | Systems and methods for edge bead removal | Chun-Hao Chang, Hsueh-Yi Chung, Shang-Yun HUANG, Jui-Ping Chuang, Fei-Gwo Tsai | 2018-03-06 |
| 9733568 | Tool and method of developing | Yi-Rem Chen, Ming-Shane Lu, Chung-Hao Chang, Jui-Ping Chuang, Fei-Gwo Tsai | 2017-08-15 |
| 9442391 | Overlay sampling methodology | HAN-MING HSIEH, Li-Shiuan Chen, Chung-Hao Chang | 2016-09-13 |
| 8852673 | Defect monitoring for resist layer | Che-Rong Laing, Yung-Yao Lee, Ping-Hsi Yang | 2014-10-07 |
| 8683395 | Method and system for feed-forward advanced process control | Chih-Jen Yu, Chun-Hung Lin, Juin-Hung Lin, Hsueh-Yi Chung, Keh-Wen Chang | 2014-03-25 |
| 8429569 | Method and system for feed-forward advanced process control | Chih-Jen Yu, Chun-Hung Lin, Juin-Hung Lin, Hsueh-Yi Chung, Keh-Wen Chang | 2013-04-23 |
| 8101340 | Method of inhibiting photoresist pattern collapse | Ching-Yu Chang, Heng-Jen Lee, Chin-Hsiang Lin, Hua-Tai Lin, Kuei-Shun Chen +4 more | 2012-01-24 |
| 8048589 | Phase shift photomask performance assurance method | Yi-Ming Dai, Chien-Hsing Wu, Chi-Hung Liao | 2011-11-01 |
| 7514184 | Reticle with antistatic coating | Wei-Yu Su, Dong-Hsu Cheng | 2009-04-07 |
| 7301604 | Method to predict and identify defocus wafers | Chun-Hung Lin, Louie Liu, Chi-Hung Liao, Ham-Ming Hsieh, Yi-Chang Sung +1 more | 2007-11-27 |
| 7029800 | Reticle with antistatic coating | Wei-Yu Su, Dong-Hsu Cheng | 2006-04-18 |
| 6975407 | Method of wafer height mapping | Chun-Sheng Wang, Yi-Chang Sung, Chi-Hung Liao, Louie Liu | 2005-12-13 |
| 6734116 | Damascene method employing multi-layer etch stop layer | Cheng Guo, Dian-Hau Chen, Han-Ming Sheng | 2004-05-11 |
| 6330355 | Frame layout to monitor overlay performance of chip composed of multi-exposure images | Chia-Hsiang Chen, Chih-Chien Hung, Han-Ming Sheng, Hsiang-Chung Liu, Chun-Mei Lee +2 more | 2001-12-11 |
| 6190810 | Mark focusing system for steppers | Feng-Liang Lai, Ming-Huei Tseng, Li-Wei Kung | 2001-02-20 |