Issued Patents All Time
Showing 26–31 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7043327 | Lithography apparatus and method employing non-environmental variable correction | Chun-Lang Chen, Cheng Sun | 2006-05-09 |
| 7037628 | Method of a floating pattern loading system in mask dry-etching critical dimension control | Wei-Zen Chou, Zong-Xian Tsai | 2006-05-02 |
| 6841313 | Photomask with dies relating to different functionalities | Yeou-Hsin Hsieh, Chih-Chiang Tu, Yu-Chin King | 2005-01-11 |
| 6799312 | Dark line CD and XY-CD improvement method of the variable shaped beam lithography in mask or wafer making | Shy-Jay Lin | 2004-09-28 |
| 6383693 | Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern | Tsiao-Chen Wu | 2002-05-07 |
| 6361911 | Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure system | Wei-Zen Chou | 2002-03-26 |