Issued Patents All Time
Showing 1–25 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12013632 | Pellicle having vent hole | Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh, Pei-Cheng Hsu +2 more | 2024-06-18 |
| 11868041 | Pellicle and method of using the same | Hsin-Chang Lee, Pei-Cheng Hsu, Yun-Yue Lin | 2024-01-09 |
| 11506971 | Pellicle and method of using the same | Hsin-Chang Lee, Pei-Cheng Hsu, Yun-Yue Lin | 2022-11-22 |
| 11289341 | Pattern transfer technique and method of manufacturing the same | — | 2022-03-29 |
| 11143952 | Pellicle removal method | Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh, Pei-Cheng Hsu +2 more | 2021-10-12 |
| 10788764 | Apparatus and a method of forming a particle shield | Wen-Hao Cheng, Ching-Yueh Chen | 2020-09-29 |
| 10670959 | Pellicle and method of using the same | Hsin-Chang Lee, Pei-Cheng Hsu, Yun-Yue Lin | 2020-06-02 |
| 10490414 | Pattern transfer technique and method of manufacturing the same | — | 2019-11-26 |
| 10168626 | Apparatus and a method of forming a particle shield | Ching-Yueh Chen, Wen-Hao Cheng | 2019-01-01 |
| 10162276 | Apparatus for shielding reticle | Wen-Hao Cheng, Tsiao-Chen Wu | 2018-12-25 |
| 10126666 | Apparatus and a method of forming a particle shield | Ching-Yueh Chen, Wen-Hao Cheng | 2018-11-13 |
| 10012899 | Graphene pellicle for extreme ultraviolet lithography | Chih-Chiang Tu, Chun-Lang Chen, Jong-Yuh Chang, Chia-Shiung Tsai, Ping-Yin Liu +3 more | 2018-07-03 |
| 9513552 | Multiple-patterning photolithographic mask and method | Chang-Jyh Hsieh, Li-Wei Kung, Yung-Cheng Chen | 2016-12-06 |
| 9513542 | Lithography mask and method of forming a lithography mask | Chun-Lang Chen | 2016-12-06 |
| 8986911 | Multiple-patterning photolithographic mask and method | Yung-Cheng Chen, Li-Wei Kung, Chang-Jyh Hsieh | 2015-03-24 |
| 8921014 | Lithography mask and method of forming a lithography mask | Chun-Lang Chen | 2014-12-30 |
| 8268541 | Mask and blank storage inner gas | Cheng-Ming Lin | 2012-09-18 |
| 7839480 | Photomask haze reduction via ventilation | — | 2010-11-23 |
| 6670690 | Method of making an improved field oxide isolation structure for semiconductor integrated circuits having higher field oxide threshold voltages | Cheng-Yeh Shih | 2003-12-30 |
| 6426478 | Planarization using laser ablation | — | 2002-07-30 |
| 6346729 | Pseudo silicon on insulator MOSFET device | Mong-Song Liang, Jin-Yuan Lee | 2002-02-12 |
| 6271125 | Method to reduce contact hole aspect ratio for embedded DRAM arrays and logic devices, via the use of a tungsten bit line structure | Chen-Jong Wang, Wen-Chuan Chiang | 2001-08-07 |
| 6242341 | Planarization using laser ablation | — | 2001-06-05 |
| 6200836 | Using oxide junction to cut off sub-threshold leakage in CMOS devices | — | 2001-03-13 |
| 6177340 | Method to reduce contact hole aspect ratio for embedded DRAM arrays and logic devices, via the use of a tungsten bit line structure | Chen-Jong Wang, Wen-Chuan Chiang | 2001-01-23 |