Issued Patents All Time
Showing 51–75 of 130 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9575412 | Method and system for reducing pole imbalance by adjusting exposure intensity | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-02-21 |
| 9557649 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Chih-Tsung Shih, Jeng-Horng Chen +1 more | 2017-01-31 |
| 9557636 | Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same | Yen-Cheng Lu, Anthony Yen | 2017-01-31 |
| 9535334 | Extreme ultraviolet lithography process to print low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |
| 9535316 | Photomask with three states for forming multiple layer patterns with a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2017-01-03 |
| 9529272 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-12-27 |
| 9529250 | EUV mask with ITO absorber to suppress out of band radiation | Yi-Ling Hsieh, Jeng-Horng Chen, Anthony Yen | 2016-12-27 |
| 9529249 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2016-12-27 |
| 9488905 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-11-08 |
| 9448491 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-09-20 |
| 9442387 | Extreme ultraviolet lithography process | Yen-Cheng Lu, Anthony Yen | 2016-09-13 |
| 9442384 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-09-13 |
| 9442368 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Jeng-Horng Chen +1 more | 2016-09-13 |
| 9442365 | Mask for extreme ultraviolet lithography and method of fabricating same | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-09-13 |
| 9418862 | Method for integrated circuit patterning | Tsung-Min Huang, Chieh-Han Wu, Chung-Ju Lee, Chih-Tsung Shih, Jeng-Horng Chen | 2016-08-16 |
| 9417534 | Lithography method and structure for resolution enhancement with a two-state mask | Yen-Cheng Lu, Anthony Yen | 2016-08-16 |
| 9412647 | Via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2016-08-09 |
| 9405195 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2016-08-02 |
| 9377693 | Collector in an extreme ultraviolet lithography system with optimal air curtain protection | Chia-Ching Huang, Tsung-Yu Chen, Chia-Hao Hsu, Chia-Chen Chen | 2016-06-28 |
| 9377696 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-06-28 |
| 9354507 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2016-05-31 |
| 9316900 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2016-04-19 |
| 9304390 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2016-04-05 |
| 9285673 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Chih-Tsung Shih, Jeng-Horng Chen +1 more | 2016-03-15 |
| 9285671 | Mask for use in lithography | Yen-Cheng Lu, Anthony Yen | 2016-03-15 |