Issued Patents All Time
Showing 101–125 of 130 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8828625 | Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same | Yen-Cheng Lu, Anthony Yen | 2014-09-09 |
| 8791024 | Method to define multiple layer patterns using a single exposure | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2014-07-29 |
| 8785084 | Method for mask fabrication and repair | Yen-Cheng Lu, Anthony Yen | 2014-07-22 |
| 8765330 | Phase shift mask for extreme ultraviolet lithography and method of fabricating same | Chia-Tsung Shih, Pei-Chung Hsu, Tsiao-Chen Wu, Yen-Cheng Lu, Shu-Hao Chang +3 more | 2014-07-01 |
| 8663878 | Mask and method for forming the same | Anthony Yen | 2014-03-04 |
| 8628897 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Anthony Yen | 2014-01-14 |
| 8492054 | Mechanisms for patterning fine features | Anthony Yen | 2013-07-23 |
| 8241823 | Method of fabrication of a semiconductor device having reduced pitch | Ming-Feng Shieh, Anthony Yen, Shao-Ming Yu, Chang-Yun Chang, Jeff J. Xu +1 more | 2012-08-14 |
| 8039179 | Integrated circuit layout design | Ming-Feng Shieh, Anthony Yen, Shao-Ming Yu, Chang-Yun Chang, Jeff J. Xu +1 more | 2011-10-18 |
| 8027529 | System for improving critical dimension uniformity | Chih-Ming Ke, Jacky Huang, Chun-Kuang Chen, Tsai-Sheng Gau | 2011-09-27 |
| 7989355 | Method of pitch halving | Ming-Feng Shieh, Anthony Yen, Ming-Ching Chang, Jeff J. Xu | 2011-08-02 |
| 7924401 | Seal ring arrangements for immersion lithography systems | Burn Jeng Lin, Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, Jen-Chieh Shih | 2011-04-12 |
| 7897297 | Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask | Chih-Ming Ke, Tsai-Sheng Gau, Hung-Chang Hsieh | 2011-03-01 |
| 7862962 | Integrated circuit layout design | Ming-Feng Shieh, Anthony Yen, Shao-Ming Yu, Chang-Yun Chang, Jeff J. Xu +1 more | 2011-01-04 |
| 7777884 | Method and system for optimizing sub-nanometer critical dimension using pitch offset | Chih-Ming Ke, Yu-Hsi Wang, Jacky Huang, Tsai-Sheng Gau, Kuo-Chen Huang | 2010-08-17 |
| 7732109 | Method and system for improving critical dimension uniformity | Chih-Ming Ke, Jacky Huang, Chun-Kuang Chen, Tsai-Sheng Gau | 2010-06-08 |
| 7580129 | Method and system for improving accuracy of critical dimension metrology | Jacky Huang, Chih-Ming Ke, Tsai-Sheng Gau | 2009-08-25 |
| 7517639 | Seal ring arrangements for immersion lithography systems | Burn Jeng Lin, Tsai-Sheng Gau, Chun-Kuang Chen, Ru-Gun Liu, Jen-Chieh Shih | 2009-04-14 |
| 7259850 | Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K | Chih-Ming Ke, Pei-Hung Chen | 2007-08-21 |
| 6998198 | Contact hole printing by packing and unpacking | Burn Jeng Lin, Bang-Chein Ho | 2006-02-14 |
| 6991895 | Defocus-invariant exposure for regular patterns | Anthony Yen | 2006-01-31 |
| 6787272 | Assist feature for random, isolated, semi-dense, and other non-dense contacts | — | 2004-09-07 |
| 6784005 | Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts | Huan-Tai Lin, Anthony Yen | 2004-08-31 |
| 6749972 | Optical proximity correction common process window maximization over varying feature pitch | — | 2004-06-15 |
| 6664011 | Hole printing by packing and unpacking using alternating phase-shifting masks | Burn Jeng Lin, Bang-Chein Ho | 2003-12-16 |