Issued Patents All Time
Showing 1–25 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12356674 | Method for fabricating a strained structure and structure formed | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2025-07-08 |
| 11855210 | Method for fabricating a strained structure and structure formed | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2023-12-26 |
| 11251303 | Method for fabricating a strained structure and structure formed | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2022-02-15 |
| 11171134 | Techniques providing metal gate devices with multiple barrier layers | Xiong-Fei Yu, Chun-Yuan Chou, Kuang-Yuan Hsu, Da-Yuan Lee | 2021-11-09 |
| 10998442 | Method for fabricating a strained structure and structure formed | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2021-05-04 |
| 10818661 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2020-10-27 |
| 10693003 | Integrated circuit transistor structure with high germanium concentration SiGe stressor | Chih-Hao Chang, Chien-Hsun Wang, Chih Chieh Yeh, Chih-Hsiang Chang | 2020-06-23 |
| 10522544 | Techniques providing metal gate devices with multiple barrier layers | Xiong-Fei Yu, Chun-Yuan Chou, Kuang-Yuan Hsu, Da-Yuan Lee | 2019-12-31 |
| 10510887 | Method for fabricating a strained structure and structure formed | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2019-12-17 |
| 10468408 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2019-11-05 |
| 10312236 | Techniques providing metal gate devices with multiple barrier layers | Xiong-Fei Yu, Chun-Yuan Chou, Kuang-Yuan Hsu, Da-Yuan Lee | 2019-06-04 |
| 10090300 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2018-10-02 |
| 9922827 | Method of forming a semiconductor structure | Liang-Gi Yao, Chia-Cheng Chen, Ta-Ming Kuan, Clement Hsingjen Wann | 2018-03-20 |
| 9911735 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2018-03-06 |
| 9831243 | Techniques providing metal gate devices with multiple barrier layers | Xiong-Fei Yu, Chun-Yuan Chou, Da-Yuan Lee, Kuang-Yuan Hsu | 2017-11-28 |
| 9660082 | Integrated circuit transistor structure with high germanium concentration SiGe stressor | Chih-Hao Chang, Chien-Hsun Wang, Chih Chieh Yeh, Chih-Hsiang Chang | 2017-05-23 |
| 9647118 | Device having EPI film in substrate trench | — | 2017-05-09 |
| 9564529 | Method for fabricating a strained structure and structure formed | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2017-02-07 |
| 9425286 | Source/drain stressor having enhanced carrier mobility and method for manufacturing same | Chin-Hsiang Lin, Pang-Yen Tsai | 2016-08-23 |
| 9356109 | Metal gate transistor and integrated circuits | — | 2016-05-31 |
| 9245970 | Semiconductor structure having interfacial layer and high-k dielectric layer | Liang-Gi Yao, Chun-Hu Cheng, Chen-Yi Lee, Clement Hsingjen Wann | 2016-01-26 |
| 9202915 | Method of forming epi film in substrate trench | — | 2015-12-01 |
| 9190417 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2015-11-17 |
| 9166022 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2015-10-20 |
| 9147594 | Method for fabricating a strained structure | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2015-09-29 |