Issued Patents All Time
Showing 26–50 of 60 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9142643 | Method for forming epitaxial feature | Yu-Hung Cheng, Tsz-Mei Kwok, Chun Hsiung Tsai | 2015-09-22 |
| 9105624 | Techniques providing metal gate devices with multiple barrier layers | Xiong-Fei Yu, Chun-Yuan Chou, Da-Yuan Lee, Kuang-Yuan Hsu | 2015-08-11 |
| 9040393 | Method of forming semiconductor structure | Liang-Gi Yao, Chia-Cheng Chen, Ta-Ming Kuan, Clement Hsingjen Wann | 2015-05-26 |
| 9006056 | Method for reducing interfacial layer thickness for high-k and metal gate stack | Liang-Gi Yao, Chun-Hu Cheng, Chen-Yi Lee, Clement Hsingjen Wann | 2015-04-14 |
| 8999794 | Self-aligned source and drain structures and method of manufacturing same | Ziwei Fang, Ying Zhang | 2015-04-07 |
| 8895426 | Metal gate transistor, integrated circuits, systems, and fabrication methods thereof | — | 2014-11-25 |
| 8847333 | Techniques providing metal gate devices with multiple barrier layers | Xiong-Fei Yu, Chun-Yuan Chou, Da-Yuan Lee, Kuang-Yuan Hsu | 2014-09-30 |
| 8704280 | Semiconductor device with strained channels induced by high-k capping metal layers | — | 2014-04-22 |
| 8648400 | FinFET semiconductor device with germanium (GE) fins | — | 2014-02-11 |
| 8629426 | Source/drain stressor having enhanced carrier mobility manufacturing same | Chin-Hsiang Lin, Pang-Yen Tsai | 2014-01-14 |
| 8623728 | Method for forming high germanium concentration SiGe stressor | Chih-Hao Chang, Chien-Hsun Wang, Chih Chieh Yeh, Chih-Hsiang Chang | 2014-01-07 |
| 8597995 | Metal gate device with low temperature oxygen scavenging | — | 2013-12-03 |
| 8524587 | Non-uniformity reduction in semiconductor planarization | Neng-Kuo Chen | 2013-09-03 |
| 8501570 | Method of manufacturing source/drain structures | Ziwei Fang, Ming-Jie Huang, Yimin Huang, Zhiqiang Wu, Min Cao | 2013-08-06 |
| 8497528 | Method for fabricating a strained structure | Tsung-Lin Lee, Chih-Hao Chang, Chih-Hsin Ko, Feng Yuan | 2013-07-30 |
| 8497177 | Method of making a FinFET device | Huicheng Chang, Hung-Ta Lin, Chun-Feng Nieh | 2013-07-30 |
| 8470659 | Method for reducing interfacial layer thickness for high-k and metal gate stack | Liang-Gi Yao, Chun-Hu Cheng, Chen-Yi Lee, Clement Hsingjen Wann | 2013-06-25 |
| 8415718 | Method of forming epi film in substrate trench | — | 2013-04-09 |
| 8367498 | Fin-like field effect transistor (FinFET) device and method of manufacturing same | Chih-Hao Chang | 2013-02-05 |
| 8367534 | Non-uniformity reduction in semiconductor planarization | Neng-Kuo Chen | 2013-02-05 |
| 8334570 | Metal gate stress film for mobility enhancement in FinFET device | Clement Hsingjen Wann, Chi Cheh Yeh, Chi Chang | 2012-12-18 |
| 8304841 | Metal gate transistor, integrated circuits, systems, and fabrication methods thereof | Cheng-Tung Lin, Hsiang-Yi Wang, Wen-Chin Lee, Betty Hsieh | 2012-11-06 |
| 8268683 | Method for reducing interfacial layer thickness for high-K and metal gate stack | Liang-Gi Yao, Chun-Hu Cheng, Chen-Yi Lee, Clement Hsingjen Wann | 2012-09-18 |
| 8241823 | Method of fabrication of a semiconductor device having reduced pitch | Ming-Feng Shieh, Shinn-Sheng Yu, Anthony Yen, Shao-Ming Yu, Chang-Yun Chang +1 more | 2012-08-14 |
| 8124537 | Method for etching integrated circuit structure | Chun-Hung Lee, Chia-Chi Chung, Hsin-Chih Chen, Neng-Kuo Chen | 2012-02-28 |