Issued Patents All Time
Showing 1–25 of 67 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12349435 | Vertical device having a protrusion source | De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Ming-Ching Chang +1 more | 2025-07-01 |
| 12136624 | Fin Field-Effect Transistor and method of forming the same | Duen-Huei Hou, Tsu Hao Wang, Chao-Cheng Chen, Hsin-Chih Chen, Kuo-Chin Liu | 2024-11-05 |
| 12057342 | Semiconductor device and method | Shiang-Bau Wang | 2024-08-06 |
| 12033895 | Semiconductor devices and methods of manufacturing thereof | Chung-Shu Wu, Tze-Chung Lin, Shih-Chiang Chen, Hsiu-Hao Tsao | 2024-07-09 |
| 12027370 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Ming-Ching Chang, Yih-Ann Lin, De-Fang Chen, Chao-Cheng Chen | 2024-07-02 |
| 11948722 | Planar winding transformer | Yen-Shin Lai, Yong Huang, Hao-Chieh Chang | 2024-04-02 |
| 11916131 | Vertical device having a protrusion source | De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Ming-Ching Chang +1 more | 2024-02-27 |
| 11749681 | Fin field-effect transistor and method of forming the same | Duen-Huei Hou, Chao-Cheng Chen, Hsin-Chih Chen, Kuo-Chin Liu, J. H. Wang | 2023-09-05 |
| 11527430 | Semiconductor device and method | Shiang-Bau Wang | 2022-12-13 |
| 11462408 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Ming-Ching Chang, Yih-Ann Lin, De-Fang Chen, Chao-Cheng Chen | 2022-10-04 |
| 11215659 | Method for faster testing of manufactured PCB, apparatus, system, and storage medium used in method | Meng-Chu Chang, Yi-Hua CHIU | 2022-01-04 |
| 11127837 | Method of forming MOSFET structure | Ching-Feng Fu, Yu-Chan Yen, Chih-Hsin Ko, Huan-Just Lin, Hui-Cheng Chang | 2021-09-21 |
| 11121039 | FinFET structures and methods of forming the same | Chih-Han Lin, Jr-Jung Lin | 2021-09-14 |
| 11120997 | Surface treatment for etch tuning | Shih-Chiang Chen, Ryan Chia-Jen Chen, Hung-Wei Lin, Lung-Kai Mao | 2021-09-14 |
| 10897126 | Charge cabinet and storage device thereof | Yi-Cheng Chien | 2021-01-19 |
| 10879129 | Self-aligned nanowire formation using double patterning | Ching-Feng Fu, De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Huan-Just Lin | 2020-12-29 |
| 10854728 | Vertical device having a protrusion structure | De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Ming-Ching Chang +1 more | 2020-12-01 |
| 10847409 | Semiconductor device and method | Shiang-Bau Wang | 2020-11-24 |
| 10748768 | Method for mandrel and spacer patterning | Yu-Chao Lin, Chao-Cheng Chen, Yu-Lung Yang | 2020-08-18 |
| 10665457 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Ming-Ching Chang, Yih-Ann Lin, De-Fang Chen, Chao-Cheng Chen | 2020-05-26 |
| 10505014 | Vertical device having a protrusion source | De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Ming-Ching Chang +1 more | 2019-12-10 |
| 10504792 | Self-aligned nanowire formation using double patterning | Ching-Feng Fu, De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Huan-Just Lin | 2019-12-10 |
| 10468308 | FinFET structures and methods of forming the same | Chih-Han Lin, Jr-Jung Lin | 2019-11-05 |
| 10461170 | Method of forming MOSFET structure | Ching-Feng Fu, Yu-Chan Yen, Chih-Hsin Ko, Huan-Just Lin, Hui-Cheng Chang | 2019-10-29 |
| 10312158 | Method for forming semiconductor device structure with gate structure | Yi-Cheng Li, Chien-Hao Chen, Yung-Cheng Lu, Jr-Jung Lin, Chao-Cheng Chen | 2019-06-04 |