Issued Patents All Time
Showing 1–25 of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12243924 | Gate structure with non-linear profile for transistors | Chih-Ping Wang, Chao-Cheng Chen, Chi-Wei Yang | 2025-03-04 |
| 12211750 | Mechanisms for forming FinFET device | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2025-01-28 |
| 12142609 | Dummy fin between first and second semiconductor fins | Shih-Yao Lin, Yun-Ting Chou, Chih-Han Lin | 2024-11-12 |
| 12125751 | Method and structure for FinFET isolation | Che-Cheng Chang, Chih-Han Lin | 2024-10-22 |
| 12113122 | Dummy fin profile control to enlarge gate process window | Shih-Yao Lin, Pei-Hsiu Wu, Chih-Ping Wang, Chih-Han Lin, Yun-Ting Chou +1 more | 2024-10-08 |
| 11764222 | Method of forming a dummy fin between first and second semiconductor fins | Shih-Yao Lin, Yun-Ting Chou, Chih-Han Lin | 2023-09-19 |
| 11721746 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Shih-Hao Chen, Chih-Han Lin, Mu-Tsang Lin, Yung-Jung Chang | 2023-08-08 |
| 11670711 | Metal gate electrode of a semiconductor device | Chih-Han Lin, Jin-Aun Ng, Ming-Ching Chang, Chao-Cheng Chen | 2023-06-06 |
| 11605719 | Gate structure with desired profile for semiconductor devices | Chih-Ping Wang, Chao-Cheng Chen, Chi-Wei Yang | 2023-03-14 |
| 11605564 | Method and structure for FinFET isolation | Che-Cheng Chang, Chih-Han Lin | 2023-03-14 |
| 11600717 | Dummy FIN profile control to enlarge gate process window | Shih-Yao Lin, Pei-Hsiu Wu, Chih-Ping Wang, Chih-Han Lin, Yun-Ting Chou +1 more | 2023-03-07 |
| 11380590 | Mechanisms for forming FinFET device | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2022-07-05 |
| 11257931 | Gate structure of field effect transistor with footing | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2022-02-22 |
| 11217586 | Semiconductor device having dummy fin physically separating the first and second gate stacks | Shih-Yao Lin, Yun-Ting Chou, Chih-Han Lin | 2022-01-04 |
| 11121039 | FinFET structures and methods of forming the same | Chih-Han Lin, Chun-Hung Lee | 2021-09-14 |
| 11120974 | Semiconductor device | Chang-Yin Chen, Tung-Wen Cheng, Che-Cheng Chang, Chih-Han Lin | 2021-09-14 |
| 10923353 | Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same | Chang-Yin Chen, Tung-Wen Cheng, Che-Cheng Chang, Chun-Lung Ni, Chih-Han Lin | 2021-02-16 |
| 10867865 | Method and structure for FinFET isolation | Che-Cheng Chang, Chih-Han Lin | 2020-12-15 |
| 10854742 | Metal gate electrode of a semiconductor device | Chih-Han Lin, Jin-Aun Ng, Ming-Ching Chang, Chao-Cheng Chen | 2020-12-01 |
| 10854504 | Semiconductor structure and manufacturing method thereof | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2020-12-01 |
| 10749014 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Shih-Hao Chen, Chih-Han Lin, Mu-Tsang Lin, Yung-Jung Chang | 2020-08-18 |
| 10749007 | Gate structure with desired profile for semiconductor devices | Ricky Wang, Chao-Cheng Chen, Chi-Wei Yang | 2020-08-18 |
| 10692701 | Dry etching apparatus | Chang-Yin Chen, Tung-Wen Cheng, Che-Cheng Chang, Chih-Han Lin | 2020-06-23 |
| 10672796 | Mechanisms for forming FINFET device | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2020-06-02 |
| 10535758 | Gate structure of field effect transistor with footing | Che-Cheng Chang, Chang-Yin Chen, Chih-Han Lin, Yung-Jung Chang | 2020-01-14 |