Issued Patents All Time
Showing 1–25 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12051752 | Embedded source or drain region of transistor with downward tapered region under facet region | Che-Cheng Chang, Zhe Zhang, Yung-Jung Chang | 2024-07-30 |
| 11721762 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Che-Cheng Chang, Yung-Jung Chang, Chang-Yin Chen | 2023-08-08 |
| 11705519 | Semiconductor device and manufacturing method thereof | Cheng-Yen Yu, Che-Cheng Chang, Zhe Zhang, Bo-Feng Young | 2023-07-18 |
| 11631748 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Che-Cheng Chang, Mu-Tsang Lin, Zhe Zhang | 2023-04-18 |
| 11594635 | Embedded source or drain region of transistor with downward tapered region under facet region | Che-Cheng Chang, Zhe Zhang, Yung-Jung Chang | 2023-02-28 |
| 11594534 | Semiconductor device and manufacturing method thereof | Chih-Shan Chen, Mu-Tsang Lin | 2023-02-28 |
| 11424165 | Method of manufacturing semiconductor devices having different gate dielectric thickness within one transistor | Jen-Chun Chou | 2022-08-23 |
| 11342458 | Semiconductor structure and fabricating method thereof | Che-Cheng Chang, Chang-Yin Chen, Mu-Tsang Lin | 2022-05-24 |
| 11158744 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Chang-Yin Chen, Che-Cheng Chang, Yung-Jung Chang | 2021-10-26 |
| 11120974 | Semiconductor device | Chang-Yin Chen, Che-Cheng Chang, Jr-Jung Lin, Chih-Han Lin | 2021-09-14 |
| 11043593 | Semiconductor device and manufacturing method thereof | Cheng-Yen Yu, Che-Cheng Chang, Zhe Zhang, Bo-Feng Young | 2021-06-22 |
| 11018259 | Semiconductor device comprising gate structure and doped gate spacer | Wei-Yang Lo, Chia-Ling Chan, Mu-Tsang Lin | 2021-05-25 |
| 11004845 | Semiconductor device and manufacturing method thereof | Chih-Shan Chen, Mu-Tsang Lin | 2021-05-11 |
| 10964819 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Che-Cheng Chang, Yung-Jung Chang | 2021-03-30 |
| 10923353 | Fin field effect transistor (FinFET) device with controlled end-to-end critical dimension and method for forming the same | Chang-Yin Chen, Che-Cheng Chang, Chun-Lung Ni, Jr-Jung Lin, Chih-Han Lin | 2021-02-16 |
| 10910496 | FinFET device with asymmetrical drain/source feature | Wei-Yang Lo | 2021-02-02 |
| 10879399 | Method of manufacturing semiconductor device comprising doped gate spacer | Wei-Yang Lo, Chia-Ling Chan, Mu-Tsang Lin | 2020-12-29 |
| 10868005 | FinFETs and methods of forming finFETs | Chih-Shan Chen, Wei-Yang Lo | 2020-12-15 |
| 10840378 | Fin field effect transistor (FinFET) device and method for forming the same | Zhe Zhang, Chang-Yin Chen, Che-Cheng Chang, Yung-Jung Chang | 2020-11-17 |
| 10818794 | Semiconductor structure and fabricating method thereof | Che-Cheng Chang, Chang-Yin Chen, Mu-Tsang Lin | 2020-10-27 |
| 10811516 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Che-Cheng Chang, Mu-Tsang Lin, Zhe Zhang | 2020-10-20 |
| 10804396 | Embedded source or drain region of transistor with downward tapered region under facet region | Che-Cheng Chang, Zhe Zhang, Yung-Jung Chang | 2020-10-13 |
| 10770569 | Semiconductor device | Wei-Yang Lo, Shih-Hao Chen, Mu-Tsang Lin | 2020-09-08 |
| 10730020 | Emulsification element and emulsification device | Su-En Wu, Yi-Chun Lin, Chung K. Chang | 2020-08-04 |
| 10692701 | Dry etching apparatus | Chang-Yin Chen, Che-Cheng Chang, Jr-Jung Lin, Chih-Han Lin | 2020-06-23 |