Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12193164 | Oxygen and humidity control in storage device | Shen-Min YANG, Pu Kuan Fang, Jyh-Shiou Hsu | 2025-01-07 |
| 11995065 | Database anomaly detection | Xin Li, Hanhan Xiang, Yue Zhang, Guanglei Song, Jeffrey Shane Reiter +2 more | 2024-05-28 |
| 11854851 | Interface tool | Jyh-Shiou Hsu, Chyi-Tsong Ni, Su-Horng Lin | 2023-12-26 |
| 11723152 | Oxygen and humidity control in storage device | Shen-Min YANG, Pu Kuan Fang, Jyh-Shiou Hsu | 2023-08-08 |
| 11721746 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Jr-Jung Lin, Shih-Hao Chen, Chih-Han Lin, Yung-Jung Chang | 2023-08-08 |
| 11631748 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Che-Cheng Chang, Tung-Wen Cheng, Zhe Zhang | 2023-04-18 |
| 11594534 | Semiconductor device and manufacturing method thereof | Tung-Wen Cheng, Chih-Shan Chen | 2023-02-28 |
| 11342458 | Semiconductor structure and fabricating method thereof | Che-Cheng Chang, Tung-Wen Cheng, Chang-Yin Chen | 2022-05-24 |
| 11018259 | Semiconductor device comprising gate structure and doped gate spacer | Wei-Yang Lo, Tung-Wen Cheng, Chia-Ling Chan | 2021-05-25 |
| 11004845 | Semiconductor device and manufacturing method thereof | Tung-Wen Cheng, Chih-Shan Chen | 2021-05-11 |
| 10879399 | Method of manufacturing semiconductor device comprising doped gate spacer | Wei-Yang Lo, Tung-Wen Cheng, Chia-Ling Chan | 2020-12-29 |
| 10818794 | Semiconductor structure and fabricating method thereof | Che-Cheng Chang, Tung-Wen Cheng, Chang-Yin Chen | 2020-10-27 |
| 10811516 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Che-Cheng Chang, Tung-Wen Cheng, Zhe Zhang | 2020-10-20 |
| 10770569 | Semiconductor device | Wei-Yang Lo, Shih-Hao Chen, Tung-Wen Cheng | 2020-09-08 |
| 10749014 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Jr-Jung Lin, Shih-Hao Chen, Chih-Han Lin, Yung-Jung Chang | 2020-08-18 |
| 10636788 | Semiconductor device and manufacturing method thereof | Tung-Wen Cheng, Chih-Shan Chen | 2020-04-28 |
| 10497701 | Semiconductor device and manufacturing method thereof | Tung-Wen Cheng, Chih-Shan Chen | 2019-12-03 |
| 10367079 | Method and structure for FinFET comprising patterned oxide and dielectric layer under spacer features | Che-Cheng Chang, Jr-Jung Lin, Shih-Hao Chen, Chih-Han Lin, Yung-Jung Chang | 2019-07-30 |
| 10355135 | Semiconductor structure and fabricating method thereof | Che-Cheng Chang, Tung-Wen Cheng, Chang-Yin Chen | 2019-07-16 |
| 10319842 | Method of manufacturing semiconductor device | Wei-Yang Lo, Shih-Hao Chen, Tung-Wen Cheng | 2019-06-11 |
| 10164050 | Structure and formation method of semiconductor device structure with gate stack | Bo-Feng Young, Che-Cheng Chang, Tung-Wen Cheng, Zhe Zhang | 2018-12-25 |
| 10084060 | Semiconductor structure and manufacturing method of the same | Zhe Zhang, Tung-Wen Cheng, Chang-Yin Chen, Kuo-Hui Chang, Che-Cheng Chang | 2018-09-25 |
| 10068982 | Structure and formation method of semiconductor device structure with metal gate | Che-Cheng Chang, Tung-Wen Cheng | 2018-09-04 |
| 9991385 | Enhanced volume control by recess profile control | Tung-Wen Cheng, Che-Cheng Chang, Bo-Feng Young, Cheng-Yen Yu | 2018-06-05 |
| 9978648 | Manufacturing method of semiconductor device with regrown undoped channel and regrown S/D regions | Tung-Wen Cheng, Chang-Yin Chen, Che-Cheng Chang | 2018-05-22 |