Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12193164 | Oxygen and humidity control in storage device | Shen-Min YANG, Pu Kuan Fang, Mu-Tsang Lin | 2025-01-07 |
| 12172117 | Laminar gas flow filter | Wen-Hsun Tsai, Chien-Chun Hu, Kuang-Wei Cheng, Sung-Ju Huang | 2024-12-24 |
| 12009242 | Wafer transport container | Jeng-Shin Ma, Cheng-Lung Wu | 2024-06-11 |
| 11854851 | Interface tool | Chyi-Tsong Ni, Mu-Tsang Lin, Su-Horng Lin | 2023-12-26 |
| 11723152 | Oxygen and humidity control in storage device | Shen-Min YANG, Pu Kuan Fang, Mu-Tsang Lin | 2023-08-08 |
| 10991604 | Method of manufacturing semiconductor structure | Chi-Ming Yang, Tzu-Jeng Hsu | 2021-04-27 |
| 9579697 | System and method of cleaning FOUP | Chi-Ming Yang, Kuo-Sheng Chuang | 2017-02-28 |
| 9530617 | In-situ charging neutralization | Lin-Jung Wu, Chi-Ming Yang | 2016-12-27 |
| 7265053 | Trench photolithography rework for removal of photoresist residue | — | 2007-09-04 |
| 7015089 | Method to improve etching of resist protective oxide (RPO) to prevent photo-resist peeling | Pin-Yi Hsin, Chuan-Chieh Huang | 2006-03-21 |
| 7001784 | Method to control spacer width | Pin-Yi Hsin, Jeng-Wei Yu | 2006-02-21 |
| 6569777 | Plasma etching method to form dual damascene with improved via profile | Feng-Yueh Chang, Pin-Yi Hsin | 2003-05-27 |
| 6498106 | Prevention of defects formed in photoresist during wet etching | Pin-Yi Hsin, Yu-Lun Lin | 2002-12-24 |