Issued Patents All Time
Showing 1–25 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12374542 | Cut metal gate process for reducing transistor spacing | Ming-Chang Wen, Hsien-Chin Lin, Hung-Kai Chen | 2025-07-29 |
| 12243782 | Local gate height tuning by CMP and dummy gate design | Ming-Chang Wen, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu | 2025-03-04 |
| 12218239 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang, Ming-Feng Shieh +2 more | 2025-02-04 |
| 12198988 | Gate formation of semiconductor devices | Chang-Jhih Syu, Chih-Hao Yu, Hsiu-Hao Tsao, Yu-Jiun Peng | 2025-01-14 |
| 12156394 | SRAM structure and method for forming the same | Ming-Chang Wen, Kuo-Hsiu Hsu, Jyun-Yu Tian, Wan-Yao Wu, Hung-Kai Chen +1 more | 2024-11-26 |
| 12057349 | Profile control of a gap fill structure | Wan-Yao Wu, Ming-Chang Wen | 2024-08-06 |
| 12020989 | Structure for fringing capacitance control | Keng-Yao Chen, Ming-Chang Wen | 2024-06-25 |
| 12009266 | Structure for fringing capacitance control | Keng-Yao Chen, Ming-Chang Wen | 2024-06-11 |
| 11948842 | Etch stop layer between substrate and isolation structure | Ming-Chang Wen, Hsien-Chin Lin, Hung-Kai Chen | 2024-04-02 |
| 11901237 | Semiconductor device having cut gate dielectric | Bone-Fong Wu, Ming-Chang Wen, Ya-Hsiu Lin | 2024-02-13 |
| 11817354 | Local gate height tuning by cmp and dummy gate design | Ming-Chang Wen, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu | 2023-11-14 |
| 11721761 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang, Ming-Feng Shieh +2 more | 2023-08-08 |
| 11721544 | Cut metal gate process for reducing transistor spacing | Ming-Chang Wen, Hsien-Chin Lin, Hung-Kai Chen | 2023-08-08 |
| 11699758 | Isolation structure having different distances to adjacent FinFET devices | Ming-Ching Chang, Shu-Yuan Ku | 2023-07-11 |
| 11694931 | Metal gate structure cutting process | I-Wen Wu, Chen-Ming Lee, Fu-Kai Yang, Mei-Yun Wang, Ching-Feng Fu +1 more | 2023-07-04 |
| 11574846 | Gate formation of semiconductor devices | Chang-Jhih Syu, Chih-Hao Yu, Hsiu-Hao Tsao, Yu-Jiun Peng | 2023-02-07 |
| 11508623 | Local gate height tuning by CMP and dummy gate design | Ming-Chang Wen, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu | 2022-11-22 |
| 11437278 | Method for forming semiconductor device | Bone-Fong Wu, Ming-Chang Wen, Ya-Hsiu Lin | 2022-09-06 |
| 11398384 | Methods for manufacturing a transistor gate by non-directional implantation of impurities in a gate spacer | Yu-Jiun Peng, Hsiu-Hao Tsao, Shu-Han Chen, Chang-Jhih Syu, Kuo-Feng Yu +2 more | 2022-07-26 |
| 11315933 | SRAM structure and method for forming the same | Ming-Chang Wen, Kuo-Hsiu Hsu, Jyun-Yu Tian, Wan-Yao Wu, Hung-Kai Chen +1 more | 2022-04-26 |
| 11239365 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang, Ming-Feng Shieh +2 more | 2022-02-01 |
| 11239072 | Cut metal gate process for reducing transistor spacing | Ming-Chang Wen, Hsien-Chin Lin, Hung-Kai Chen | 2022-02-01 |
| 11177180 | Profile control of a gap fill structure | Wan-Yao Wu, Ming-Chang Wen | 2021-11-16 |
| 11158725 | Fin structure of fin field effect transistor | Feng Yuan, Hung-Ming Chen, Tsung-Lin Lee, Clement Hsingjen Wann | 2021-10-26 |
| 11031501 | Isolation structure having different distances to adjacent FinFET devices | Ming-Ching Chang, Shu-Yuan Ku | 2021-06-08 |