Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11726413 | Overlay marks for reducing effect of bottom layer asymmetry | Hung-Chih Hsieh, Po-Chung Cheng | 2023-08-15 |
| 11656391 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Po-Chung Cheng, Chih-Ming Ke | 2023-05-23 |
| 11513444 | Noise reduction for overlay control | Weimin Hu, Yang-Hung Chang, Chun-Ming Hu, Chih-Ming Ke | 2022-11-29 |
| 11294293 | Overlay marks for reducing effect of bottom layer asymmetry | Hung-Chih Hsieh, Po-Chung Cheng | 2022-04-05 |
| 10983005 | Spectroscopic overlay metrology | Kai-Chiang Wu, Hung-Chih Hsieh, Chih-Ming Ke, Yen-Liang Chen | 2021-04-20 |
| 10867933 | Method for forming semiconductor device structure with overlay grating | Long Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Yu-Ching Wang +4 more | 2020-12-15 |
| 10866524 | Method and system for overlay control | Yang-Hung Chang, Chih-Ming Ke | 2020-12-15 |
| 10734325 | Method for forming semiconductor device structure with overlay grating | Long Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Yu-Ching Wang +4 more | 2020-08-04 |
| 10684556 | Noise reduction for overlay control | Weimin Hu, Yang-Hung Chang, Chun-Ming Hu, Chih-Ming Ke | 2020-06-16 |
| 10663633 | Aperture design and methods thereof | Hung-Chih Hsieh, Kai-Chiang Wu, Yen-Liang Chen, Po-Chung Cheng, Chih-Ming Ke | 2020-05-26 |
| 10514612 | Method and system for overlay control | Yang-Hung Chang, Chih-Ming Ke | 2019-12-24 |
| 10461037 | Method for forming semiconductor device structure with overlay grating | Long Chen, Jia-Hong Chu, Chi-Wen Lai, Chia-Ching Liang, Yu-Ching Wang +4 more | 2019-10-29 |
| 10281827 | Noise reduction for overlay control | Weimin Hu, Yang-Hung Chang, Chun-Ming Hu, Chih-Ming Ke | 2019-05-07 |
| 10204867 | Semiconductor metrology target and manufacturing method thereof | Long Chen, Jia-Hong Chu, Hsin-Chin LIN, Hsiang-Yu SU, Yun-Heng Tseng +4 more | 2019-02-12 |
| 10031426 | Method and system for overlay control | Yang-Hung Chang, Chih-Ming Ke | 2018-07-24 |
| 9766554 | Method and apparatus for estimating focus and dose of an exposure process | Yen-Liang Chen, Chih-Ming Ke, Wen-Zhan Zhou | 2017-09-19 |
| 9690212 | Hybrid focus-exposure matrix | Wen-Zhan Zhou, Heng-Jen Lee, Yen-Liang Chen, Chih-Ming Ke, Ho-yung David Hwang | 2017-06-27 |
| 9418199 | Method and apparatus for extracting systematic defects | Jia-Rui Hu, Chih-Ming Ke, Hua-Tai Lin, Tsai-Sheng Gau | 2016-08-16 |
| 9070622 | Systems and methods for similarity-based semiconductor process control | Chih-Ming Ke, Ching-Pin Kao, Yang-Hung Chang, Chun-Ming Hu | 2015-06-30 |
| 9053284 | Method and system for overlay control | Yang-Hung Chang, Chih-Ming Ke | 2015-06-09 |
| 8984450 | Method and apparatus for extracting systematic defects | Jia-Rui Hu, Chih-Mihg Ke, Hua-Tai Lin, Tsai-Sheng Gau | 2015-03-17 |
| 7301603 | Exposure system and method | Chun-Ming Hu, Yung-Chih Chang | 2007-11-27 |
| 7004814 | CMP process control method | Chen-Shien Chen, Yai-Yei Huang, Yean-Zhaw Chen, Yih-Shung Lin | 2006-02-28 |