| 12368033 |
Methods and apparatus for physical vapor deposition (PVD) dielectric deposition |
William Fruchterman |
2025-07-22 |
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| 12176205 |
Method and chamber for backside physical vapor deposition |
Chunming Zhou, Yong Cao, Kevin Moraes, Shane Lavan |
2024-12-24 |
$95,614,000 |
| 12142478 |
Method and chamber for backside physical vapor deposition |
Chunming Zhou, Yong Cao, Kevin Moraes, Shane Lavan |
2024-11-12 |
$39,712,000 |
| 12027354 |
Cleaning of SIN with CCP plasma or RPS clean |
Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung, Xianmin Tang +4 more |
2024-07-02 |
$85,126,000 |
| 11994800 |
Dose reduction of patterned metal oxide photoresists |
Tejinder Singh, Lifan Yan, Abhijit Basu Mallick, Daniel Lee Diehl, Ho-yung David Hwang |
2024-05-28 |
$67,076,000 |
| 11915918 |
Cleaning of sin with CCP plasma or RPS clean |
Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung, Xianmin Tang +4 more |
2024-02-27 |
$57,915,000 |
| 11842890 |
Methods and apparatus for physical vapor deposition (PVD) dielectric deposition |
William Fruchterman |
2023-12-12 |
$82,062,000 |
| 11661651 |
Methods and apparatus for passivating a target |
Chao Du, Xing CHEN, Keith A. Miller, Jianxin Lei |
2023-05-30 |
$32,229,000 |
| 11655534 |
Apparatus for reducing tungsten resistivity |
Wenting Hou, Jianxin Lei, Prashanth Kothnur, William Johanson |
2023-05-23 |
$53,064,000 |
| 11572618 |
Method and chamber for backside physical vapor deposition |
Xiaozhou Che, Yong Cao, Shane Lavan, Chunming Zhou |
2023-02-07 |
$44,390,000 |
| 11550222 |
Dose reduction of patterned metal oxide photoresists |
Tejinder Singh, Lifan Yan, Abhijit Basu Mallick, Daniel Lee Diehl, Ho-yung David Hwang |
2023-01-10 |
$38,290,000 |
| 11512387 |
Methods and apparatus for passivating a target |
Chao Du, Xing CHEN, Keith A. Miller, Jianxin Lei |
2022-11-29 |
$23,914,000 |
| 11495461 |
Film stack for lithography applications |
Tejinder Singh, Suketu Arun Parikh, Daniel Lee Diehl, Michael Stolfi, Yong Cao +3 more |
2022-11-08 |
$47,551,000 |
| 11469096 |
Method and chamber for backside physical vapor deposition |
Chunming Zhou, Yong Cao, Kevin Moraes, Shane Lavan |
2022-10-11 |
$43,708,000 |
| 11450514 |
Methods of reducing particles in a physical vapor deposition (PVD) chamber |
Wei Dou, Yong Cao, Mingdong Li, Shane Lavan, Chengyu Liu |
2022-09-20 |
$25,949,000 |
| 11447857 |
Methods and apparatus for reducing tungsten resistivity |
Wenting Hou, Jianxin Lei, Prashanth Kothnur, William Johanson |
2022-09-20 |
$25,949,000 |
| 11270898 |
Apparatus for enhancing flow uniformity in a process chamber |
Kirankumar Neelasandra SAVANDAIAH, Fuhong Zhang, William Johanson |
2022-03-08 |
$69,139,000 |
| 10734235 |
Systems and methods for low resistivity physical vapor deposition of a tungsten film |
Thanh X. Nguyen, Zhiyong Wang, Jianxin Lei, Xianmin Tang |
2020-08-04 |
$43,243,000 |
| 10388532 |
Methods and devices using PVD ruthenium |
Ross Marshall, Jianxin Lei, Xianmin Tang |
2019-08-20 |
$26,004,000 |
| 10043670 |
Systems and methods for low resistivity physical vapor deposition of a tungsten film |
Thanh X. Nguyen, Zhiyong Wang, Jianxin Lei, Xianmin Tang |
2018-08-07 |
$22,921,000 |
| 9461137 |
Tungsten silicide nitride films and methods of formation |
Rajkumar Jakkaraju, Jianxin Lei, Zhiyong Wang |
2016-10-04 |
$14,162,000 |
