Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12325909 | EM source for enhanced plasma control | Alexander Jansen, Keith A. Miller, Martin Lee Riker, David Gunther, Emily Schooley | 2025-06-10 |
| 12203163 | Methods for shaping magnetic fields during semiconductor processing | Goichi Yoshidome, Suhas Bangalore Umesh, Sushil Arun Samant, Martin Lee Riker, Wei Lei +4 more | 2025-01-21 |
| 12131105 | Virtual measurement of conditions proximate to a substrate with physics-informed compressed sensing | Preetham Rao | 2024-10-29 |
| 12043895 | Methods of using a segmented showerhead for uniform delivery of multiple pre-cursors | Alexander Lerner, Roey Shaviv, Satish Radhakrishnan | 2024-07-23 |
| 12001197 | Eco-efficiency (sustainability) dashboard for semiconductor manufacturing | Ala Moradian, Elizabeth Neville, Umesh M. Kelkar, Mark Denome, Karthik Ramanathan +3 more | 2024-06-04 |
| 11970775 | Showerhead for providing multiple materials to a process chamber | Satish Radhakrishnan, Alexander Lerner, Sergei Klimovich, Roey Shaviv | 2024-04-30 |
| 11834743 | Segmented showerhead for uniform delivery of multiple precursors | Alexander Lerner, Roey Shaviv, Satish Radhakrishnan | 2023-12-05 |
| 11692262 | EM source for enhanced plasma control | Alexander Jansen, Keith A. Miller, Martin Lee Riker, David Gunther, Emily Schooley | 2023-07-04 |
| 11655534 | Apparatus for reducing tungsten resistivity | Wenting Hou, Jianxin Lei, Jothilingam Ramalingam, William Johanson | 2023-05-23 |
| 11600476 | Deposition system with multi-cathode and method of manufacture thereof | Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Hanbing Wu, Chi Hong Ching | 2023-03-07 |
| 11505863 | Methods for forming films on substrates | Alexander Lerner, Roey Shaviv, Satish Radhakrishnan, Xiaozhou Che | 2022-11-22 |
| D969980 | Deposition chamber showerhead | Alexander Lerner, Graeme Scott | 2022-11-15 |
| 11495440 | Plasma density control on substrate edge | Bhaskar Kumar, Sidharth Bhatia, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian +1 more | 2022-11-08 |
| D967351 | Showerhead reflector | Alexander Lerner, Graeme Scott | 2022-10-18 |
| 11447857 | Methods and apparatus for reducing tungsten resistivity | Wenting Hou, Jianxin Lei, Jothilingam Ramalingam, William Johanson | 2022-09-20 |
| 11393703 | Apparatus and method for controlling a flow process material to a deposition chamber | Alexander Lerner, Roey Shaviv, Phillip Stout, Joseph M. Ranish, Satish Radhakrishnan | 2022-07-19 |
| 11183375 | Deposition system with multi-cathode and method of manufacture thereof | Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Hanbing Wu, Chi Hong Ching | 2021-11-23 |
| 11170982 | Methods and apparatus for producing low angle depositions | Anantha K. Subramani, Praburam Gopal Raja, Steven V. Sansoni, John C. Forster, Philip Allan Kraus +5 more | 2021-11-09 |
| 10790121 | Plasma density control on substrate edge | Bhaskar Kumar, Sidharth Bhatia, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian +1 more | 2020-09-29 |
| 9991101 | Magnetron assembly for physical vapor deposition chamber | William Johanson, Brij Datta, Fuhong Zhang, Adolph Miller Allen, Yu Liu | 2018-06-05 |
| 9928997 | Apparatus for PVD dielectric deposition | Keith A. Miller, Thanh X. Nguyen, Ilya Lavitsky, Randy D. Schmieding | 2018-03-27 |
| 9831074 | Bipolar collimator utilized in a physical vapor deposition chamber | Joung Joo Lee, Guojun Liu, Wei Wang | 2017-11-28 |
| 9620339 | Sputter source for semiconductor process chambers | Anantha K. Subramani, Tza-Jing Gung, Hanbing Wu | 2017-04-11 |
| 9591738 | Plasma generator systems and methods of forming plasma | Huatan Qiu, David Cheung | 2017-03-07 |
| 9520267 | Bias voltage frequency controlled angular ion distribution in plasma processing | Ludovic Godet, Jun Xue, Umesh M. Kelkar, Matthew D. Scotney-Castle | 2016-12-13 |