Issued Patents All Time
Showing 1–25 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12100576 | Metal oxide preclean chamber with improved selectivity and flow conductance | Andrew Nguyen, Xue Yang Chang, Yu Lei, Xianmin Tang, John C. Forster +2 more | 2024-09-24 |
| 12027354 | Cleaning of SIN with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Xianmin Tang +4 more | 2024-07-02 |
| 11948846 | Analyzing in-plane distortion | Wenjiao Wang, Joshua Maher, Xinhai Han, Deenesh Padhi | 2024-04-02 |
| 11915918 | Cleaning of sin with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Xianmin Tang +4 more | 2024-02-27 |
| 11898236 | Methods and apparatus for processing a substrate | Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi +9 more | 2024-02-13 |
| 11637107 | Silicon-containing layer for bit line resistance reduction | Tom Ho Wing Yu, Nobuyuki Sasaki, Jianxin Lei, Wenting Hou, Rongjun Wang | 2023-04-25 |
| 11637043 | Analyzing in-plane distortion | Wenjiao Wang, Joshua Maher, Xinhai Han, Deenesh Padhi | 2023-04-25 |
| 11626410 | Silicon-containing layer for bit line resistance reduction | Tom Ho Wing Yu, Nobuyuki Sasaki, Jianxin Lei, Wenting Hou, Rongjun Wang | 2023-04-11 |
| 11587764 | Magnetic housing systems | Srinivas Gandikota, Samuel E. Gottheim, Timothy Joseph Franklin, Pramit Manna, Eswaranand Venkatasubramanian +3 more | 2023-02-21 |
| 11562909 | Directional selective junction clean with field polymer protections | Yu Lei, Xuesong Lu, Tae Hong Ha, Xianmin Tang, Andrew Nguyen +4 more | 2023-01-24 |
| 11339475 | Film stack overlay improvement | Xinhai Han, Deenesh Padhi, Daemian Raj Benjamin Raj, Kristopher Enslow, Wenjiao Wang +8 more | 2022-05-24 |
| 11289312 | Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability | Adolph Miller Allen, Vanessa Faune, Zhong Qiang Hua, Kirankumar Neelasandra SAVANDAIAH, Anantha K. Subramani +5 more | 2022-03-29 |
| 11276569 | On stack overlay improvement for 3D NAND | Yongjing Lin, Masaki Ogata, Yusheng Zhou, Xinhai Han, Deenesh Padhi +3 more | 2022-03-15 |
| 11152248 | Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions | Jingmei Liang, Yong Sun, Jinrui GUO, Praket P. Jha, Jung Chan Lee +1 more | 2021-10-19 |
| 10790180 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal, Vijay D. Parkhe +2 more | 2020-09-29 |
| 10763090 | High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process | Adolph Miller Allen, Lara Hawrylchak, Zhigang Xie, Muhammad M. Rasheed, Rongjun Wang +8 more | 2020-09-01 |
| 10707116 | Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions | Jingmei Liang, Yong Sun, Jinrui GUO, Praket P. Jha, Jung Chan Lee +1 more | 2020-07-07 |
| 10597785 | Single oxide metal deposition chamber | Anantha K. Subramani, Praburam Gopalraja, Hari Ponnekanti, Philip Allan Kraus | 2020-03-24 |
| 10595477 | Oxide with higher utilization and lower cost | Lei Guo, Praket P. Jha, Milind Gadre, Deenesh Padhi | 2020-03-24 |
| 10577689 | Sputtering showerhead | Anantha K. Subramani, Praburam Gopalraja, Hari Ponnekanti | 2020-03-03 |
| 10553398 | Power deposition control in inductively coupled plasma (ICP) reactors | Samer Banna, Vladimir Knyazik, Kyle Tantiwong, Dan Marohl, Valentin N. Todorow +1 more | 2020-02-04 |
| 10541159 | Processing chamber with irradiance curing lens | Orlando Trejo, Ramprakash Sankarakrishnan | 2020-01-21 |
| 10515796 | Dry etch rate reduction of silicon nitride films | Michael Wenyoung Tsiang, Hang Yu, Deenesh Padhi | 2019-12-24 |
| 10460968 | Electrostatic chuck with variable pixelated magnetic field | Chih-Hsun Hsu, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal, Vijay D. Parkhe +2 more | 2019-10-29 |
| 10410889 | Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors | S. M. Reza Sadjadi, Haitao Wang, Jie Zhou, Chunlei Zhang, Fernando Silveira | 2019-09-10 |