Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12338527 | Shutter disk for physical vapor deposition (PVD) chamber | Zhiyong Wang, Irena H. Wysok, Jianxin Lei, Rongjun Wang, Lei Zhou +2 more | 2025-06-24 |
| 11932934 | Method for particle removal from wafers through plasma modification in pulsed PVD | Lei Zhou, Adolph Miller Allen, Vaibhav Soni, Kishor Kalathiparambil, Vanessa Faune +1 more | 2024-03-19 |
| 11898236 | Methods and apparatus for processing a substrate | Zhiyong Wang, John C. Forster, Irena H. Wysok, Tiefeng Shi, Gang Fu +9 more | 2024-02-13 |
| 11661652 | Wet cleaning inside of gasline of semiconductor process equipment | Gang Peng, Marcus Pereira, David W. Groechel | 2023-05-30 |
| 11473189 | Method for particle removal from wafers through plasma modification in pulsed PVD | Lei Zhou, Adolph Miller Allen, Vaibhav Soni, Kishor Kalathiparambil, Vanessa Faune +1 more | 2022-10-18 |
| 11289312 | Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability | Adolph Miller Allen, Vanessa Faune, Zhong Qiang Hua, Kirankumar Neelasandra SAVANDAIAH, Anantha K. Subramani +5 more | 2022-03-29 |
| 11251024 | Coating for chamber particle reduction | Hsin-wei Tseng, Casey Jane Madsen, Yikai Chen, Irena H. Wysok | 2022-02-15 |
| 11249390 | Extreme ultraviolet mask absorber materials | Shuwei Liu, Vibhu Jindal | 2022-02-15 |