| 11932934 |
Method for particle removal from wafers through plasma modification in pulsed PVD |
Halbert Chong, Lei Zhou, Adolph Miller Allen, Vaibhav Soni, Kishor Kalathiparambil +1 more |
2024-03-19 |
| 11935732 |
Process kit geometry for particle reduction in PVD processes |
Adolph Miller Allen, Kirankumar Neelasandra SAVANDAIAH, Randal Dean Schmieding |
2024-03-19 |
| 11473189 |
Method for particle removal from wafers through plasma modification in pulsed PVD |
Halbert Chong, Lei Zhou, Adolph Miller Allen, Vaibhav Soni, Kishor Kalathiparambil +1 more |
2022-10-18 |
| 11289312 |
Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability |
Adolph Miller Allen, Zhong Qiang Hua, Kirankumar Neelasandra SAVANDAIAH, Anantha K. Subramani, Philip Allan Kraus +5 more |
2022-03-29 |
| 11049701 |
Biased cover ring for a substrate processing system |
Adolph Miller Allen, William Johanson, Viachslav Babayan, Zhong Qiang Hua, Carl Johnson +4 more |
2021-06-29 |
| 11024490 |
Magnetron having enhanced target cooling configuration |
William Johanson, Kirankumar Neelasandra SAVANDAIAH |
2021-06-01 |
